Contrast Evaluation of the SCALPEL GHOST in 100 kV Electron Projection Lithography

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-12-30

著者

• Nomura Eiichi

  Fundamental Research Laboratories Nec Corporation

• YAMASHITA Hiroshi

  ULSI Device Development Labs, NEC Corporation

• KOBA Fumihiro

  ULSI Device Development Division, NEC Corporation

• Koba Fumihiro

  Ulsi Device Development Division Nec Corporation

• Yamashita Hiroshi

  Ulsi Device Development Division Nec Corporation

関連論文

• Proximity Effect Correction by Pattern Modified Stencil Mask in Large-Field Projection Electron-Beam Lithography
• Recent Progress in Electron-Beam Cell Projection Techology
• Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography
• Calixarene Electron Beam Resist for Nano-Lithography
• Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography
• Coulomb Interaction Effect in Cell Projection Lithography
• Contrast Evaluation of the SCALPEL GHOST in 100 kV Electron Projection Lithography
• Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650
• 0.15 μm Electron Beam Direct Writing for Gbit Dynamic Random Access Memory Fabrication
• 0.15 µm Electron Beam Direct Writing for Gbit Dynamic Random Access Memory Fabrication

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