TANIGAWA Takaho | ULSI Device Development Laboratories NEC Corporation

スポンサーリンク

概要

• TANIGAWA Takahoの詳細を見る
• 同名の論文著者
• ULSI Device Development Laboratories NEC Corporationの論文著者

関連著者

• TANIGAWA Takaho

  ULSI Device Development Laboratories NEC Corporation

• Tanigawa Takaho

  Faculty Of Engineering Science Osaka University

• Namba Susumu

  Faculty Of Engineering Science Osaka University

• GAMO Kenji

  Faculty of Engineering Science, Osaka University

• TAKAI Mikio

  Faculty of Engineering Science, and Research Center for Extreme Materials, Osaka University

• Gamo Kenji

  Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University

• Takai Mikio

  Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University

• Namba S

  Riken The Institute Of Physical And Chemical Research

• Namba Susumu

  Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University

• Namba S

  Faculty Of Engineering Osaka University

• Nonoyama Shinji

  Quantum Material Research Laboratory Frontier Research Program The Institute Of Physical And Chemica

• NAKASHIMA Shin-ichi

  Faculty of Engineering, Osaka University

• 藤田 善弘

  日本電気株式会社

• Koga H

  Kyushu Inst. Technol. Iizuka‐shi Jpn

• Namba Susumu

  Research Center For Extreme Materials And Department Of Electrical Engineering Osaka University

• Namba Susumu

  Frontier Research Program Riken

• Koga Takuya

  Incubation Center Nec Corporation

• Miyauchi Michihiro

  Faculty Of Engineering Osaka University

• 藤田 善弘

  Nec C&cイノベーション研究所

• Yabe Yoshikazu

  Silicon Systems Research Laboratories Nec Corporation

• Koyama Kuniaki

  Ulsi Device Development Laboratories Nec Corporation

• AIMOTO Yoshiharu

  Silicon Systems Research Laboratories NEC Corporation

• KIMURA Tohru

  Silicon Systems Research Laboratories NEC Corporation

• HEIUCHI Hideki

  Silicon Systems Research Laboratories NEC Corporation

• NAKAZAWA Youetsu

  Silicon Systems Research Laboratories NEC Corporation

• MOTOMURA Masato

  Silicon Systems Research Laboratories NEC Corporation

• FUJITA Yoshihiro

  Incubation Center NEC Corporation

• HAMADA Masayuki

  ULSI Device Development Laboratories NEC Corporation

• NOBUSAWA Hajime

  ULSI Device Development Laboratories NEC Corporation

• Nagatomo S

  Shizuoka Univ. Shizuoka Jpn

• Hamada M

  Ulsi Device Development Laboratories Nec Corporation

• Minamisono Tadanori

  Faculty of Science, Osaka University

• Koyama K

  Ulsi Device Development Laboratories Nec Corporation

• YOSHINO Akira

  ULSI Device Development Laboratories, NEC Corporation

• KOGA Hiroki

  ULSI Device Development Laboratories, NEC Corporation

• OHYA Shuichi

  ULSI Device Development Laboratories, NEC Corporation

• Ohya Shuichi

  Ulsi Device Development Laboratories Nec Corporation

• Koga Hiroki

  Ulsi Device Development Division:(present Address)sony Corporation

• Yoshino Akira

  Ulsi Device Development Laboratories Nec Corporation

• NAMBA Susumu

  Research Center for Extreme Materials and Department of Electrical Engineering, Osaka University

もっと見る 閉じる

著作論文

• Design of 1024-l/Os 3.84GB/s High Bandwidth 600mW Low Power 16Mb DRAM Macros for Parallel Image Processing RAM(Special Issue on Multimedia, Network, and DRAM LSIs)
• Improvement of Refresh Characteristics by SIMOX Technology for Giga-bit DRAMs (Special Issue on ULSI Memory Technology)
• Residual Strain in Single Crystalline Germanium Islands on Insulator
• Thickness Dependence of SiO_2 Capping Layers on Recrystallization of Germanium Islands on Insulator
• Gallium Arsenide Layers Grown by Molecular Beam Epitaxy on Single Crystalline Germanium Islands on Insulator
• Single Crystalline Germanium Island on Insulator by Zone Melting Recrystallization

スポンサーリンク