Dynamic Behavior of 30-ps Pulsed-Laser Annealing in Ion-Implanted Si

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1979-12-05

著者

• Aoyagi Y

  Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technology

• Aoyagi Y

  Inst. Physics And Chemical Res. (riken) Wako Jpn

• Namba Susumu

  Institute Of Physical And Chemical Research

• Kawabe M

  Univ. Tsukuba Ibaraki Jpn

• Kawabe M

  Nikko Materials Co. Ltd. Saitama Jpn

• Kawabe Mitsuo

  Institute Of Applied Physics University Of Tsukuba

• GAMO Kenji

  Faculty of Engineering Science, Osaka University

• AOYAGI Yoshinobu

  Institute of Physical and Chemical Research (RIKEN)

• Gamo Kenji

  Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University

• Namba S

  Faculty Of Engineering Science Osaka University

• Murakami Kouichi

  Faculty Of Engineering Science Osaka University

• Aoyagi Yoshinobu

  Institute Of Physical And Chemical Research

• KAWABE Mitsuo

  The Institute of Material Science, University of Tsukuba

• Namba S

  Riken The Institute Of Physical And Chemical Research

• Murakami Kouichi

  Faculty Of Engineering Ehime University

• Namba S

  Faculty Of Engineering Osaka University

• NAMBA Susumu

  Research Center for Extreme Materials and Department of Electrical Engineering, Osaka University

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