Self-Development Properties of Nitrocellulose (Dependence on Ion Species)
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概要
- 論文の詳細を見る
Self-development properties (etch rate and formation of non-volatile residue) of nitrocellulose when it was exposed to various 50 keV ions (N+, Ne+, Ar+, Kr+ and Xe+) were studied. A maximum etch rate was obtained for the irradiation of Ar+. It was found from the results of the Auger electron spectroscopy that the irradiation of ions lighter than Ar+ (N+ and Ne+) caused a carbon-rich residue. The relationship between the experimental results and the calculated ion penetration depth and the energy deposition density is discussed.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1989-04-20
著者
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Yasuoka Yoshizumi
Department Of Electrical And Electronic Engineering National Defense Academy
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Gamo Kenji
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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Kaneko Hidehiko
Department Of Electronic Engineering The National Defense Academy
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Namba Susumu
Faculty of Engineering Science, Osaka University, Machikaneyama, Toyonaka 560
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Kaneko Hidehiko
Department of Electrical Engineering, The National Defense Academy, Hashirimizu, Yokosuka 239
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