A Study on the Characteristics of Low-Energy Ion-Beam-Assisted Deposition of Tungsten
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概要
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The characteristics of the low-energy ion-beam-assisted deposition (IBAD) of tungsten films was investigated. Hexacarbonyl tungsten (W(CO)_6) and a 0.5 keV Ar^+ beam were used for deposition. X-ray photoelectron spectroscopy (XPS) demonstrated that the W(CO)_6 adsorbed on the substrate was decomposed and metallic tungsten was formed by ion beam irradiation. Quadrupole mass spectrometer and XPS analyses showed that the CO molecule was mainly dissociated from the W(CO)_6. The deposition rate of tungsten films was proportional to the ion current density and the deposition yield was acdl.7 atoms/ion. The deposited film consists of acd76% tungsten and has a resistivity of acd600μΩ・cm.
- 社団法人応用物理学会の論文
- 1992-04-15
著者
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Gamo Kenji
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Koh Young-bum
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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