A Blazed Si Grating for Soft X-Ray Fabricated by Two-Stage Reactive Ion-Beam Etching
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概要
- 論文の詳細を見る
A blazed Si grating with a blaze angle of 3°is successfully fabricated using holographic exposure and reactive ion-beam etching. A new two-stage etching technique is developed for a grating with a blaze angle of less than 1°in Si single crystal, combining inclined and normal incident reactive ion-beam etching techniques. These diffraction gratings can be expected to be very useful in a soft X-ray region.
- 社団法人応用物理学会の論文
- 1983-04-20
著者
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Namba Susumu
Faculty Of Engineering Science Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Matsui Shinji
Nippon Electric Co. Ltd
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Aritome H
Research Center For Extreme Materials Faculty Of Engineering Science Osaka University
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Aritome Hiroaki
Faculty Of Engineering Osaka University
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YAMATO Toshiya
Matsushita Electronics Corporation
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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