Aritome Hiroaki | Faculty Of Engineering Osaka University

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概要

• 同名の論文著者
• Faculty Of Engineering Osaka Universityの論文著者

関連著者

• Aritome Hiroaki

  Faculty Of Engineering Osaka University

• Namba Susumu

  Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University

• Namba Susumu

  Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University

• Aritome H

  Research Center For Extreme Materials Faculty Of Engineering Science Osaka University

• Namba Susumu

  Faculty Of Engineering Science Osaka University

• Matsui Shinji

  Nippon Electric Co. Ltd

• Moriwaki Kazuyuki

  Faculty Of Engineering Science Osaka University:(present Address) Electrical Communication Laborator

• Moriwaki K

  Ntt Applied Electronics Laboratories

• MATSUI Shinji

  Faculty of Engineering Science, Osaka University

• Masuda Kohzoh

  Faculty Of Engineering Science Osaka University

• YAMATO Toshiya

  Matsushita Electronics Corporation

• Aritome Hiroaki

  Faculty Of Engineering Science Osaka University

• ARITOME Hiroaki

  Department of Electrical Engineering, Faculty of Engineering Science, Osaka University

• YAMATO Toshiya

  Faculty of Engineering Science, Osaka University

• Nishimura Tadashi

  Faculty Of Engineering Science Osaka University

• Masuda Noboru

  Faculty Of Engineering Science Osaka University

• Kawabe Mitsuo

  Faculty Of Engineering Science Osaka University

• Masuda Kohzoh

  Faculty Of Material Science University Of Tsukuba

• Nakamura Takehiro

  Faculty Of Engineering Science Osaka University

• Takada Noboru

  Faculty Of Engineering Science Osaka University:(present Address)fujitsu Ltd.

• MIYAZAKI KazuhiKo

  Faculty of Engineering Science, Osaka University

• Hasegawa Shinya

  Faculty Of Engineering Science Osaka University

• Takada Noboru

  Faculty Of Agriculture And Life Science Hirosaki University

• NAMBA Susum

  Faculty of Engineering Science, Osaka University

• Namba Susum

  Faculty Of Engineering Science Osaka University

• SAKANO Kiyoji

  Faculty of Engineering Science, Osaka University

• KARAPIPERIS Leonidas

  Physics Department and National Research and Resource Facility for Submicron Structures, Cornell Uni

• Miyazaki Kazuhiko

  Faculty Of Engineering Science Osaka University

• Yamaguchi Jiro

  Faculty Of Engineering Kansai University

• WATANABE Koya

  Faculty of Engineering, Osaka University

• AOKI Hitoshi

  Faculty of Engineering Science, Osaka University

• Aoki Hitoshi

  Faculty Of Engineering Science Osaka University:(present Address)sharp Corporation.

• Sakano Kiyoji

  Faculty Of Engineering Science Osaka University:(present Address) Sharp Corporation Integrated Circu

• Watanabe Koya

  Faculty Of Engineering Osaka University

• Mizuki Sin'ya

  Nippon Soken

• KARAPIPERIS Leonidas

  Physics Department and National Research and Resource Facility for Submicron Structures, Cornell University

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著作論文

• Fabrication of CdTe Optical Waveguide by LPE Using the Boat-Slide Technique
• Optical Waveguiding and Electrooptic Modulation in Ion-Implanted CdTe
• Optical Waveguides Fabricated by B Ion Implanted into Fused Quartz
• A Large Time Delay of the Stimulated Emission in CdS Laser Pumped by an Electron Beam
• Contrast of the X-Ray Mask for Synchrotron Radiation and the Characteristics of Replicated Pattern
• A Blazed Si Grating for Soft X-Ray Fabricated by Two-Stage Reactive Ion-Beam Etching
• Graphoepitaxy of Ge Films on SiO_2 by Zone Melting Recrystallization
• Fabrication of 80 nm-Wide Lines in FPM Resist by H^+ Beam Exposure
• Fabrication of Si0_2 Grating Patterns with Vertical Sidewalls by S0R X-Ray Lithography and Reactive Ion-Beam Etching
• Etched Profile of Si by Ion-Bombardment-Enhanced Etching
• Reactive Ion-Beam Etching of Silicon Carbide
• Microfabrication of LiNbO_3 by Reactive Ion-Beam Etching
• Fabrication of SiO_2 Blazed Holographic Gratings by Reactive Ion-Etching
• Fabrication of a Grating Pattern with Submicrometer Dimension in Silicon Crystal by Ion-Bombardment-Enhanced Etching
• Current Oscillation in Germanium Slice in a Transverse Magnetic Field
• Focusing Characteristics of X-Ray Zone Plates Fabricated by Electron Beam Lithography and Reactive Ion Etching

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