Aritome H | Research Center For Extreme Materials Faculty Of Engineering Science Osaka University
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概要
関連著者
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Aritome H
Research Center For Extreme Materials Faculty Of Engineering Science Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Aritome Hiroaki
Faculty Of Engineering Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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Namba Susumu
Faculty Of Engineering Science Osaka University
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Matsui Shinji
Nippon Electric Co. Ltd
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Moriwaki Kazuyuki
Faculty Of Engineering Science Osaka University:(present Address) Electrical Communication Laborator
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Moriwaki K
Ntt Applied Electronics Laboratories
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Masuda Kohzoh
Faculty Of Engineering Science Osaka University
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ARITOME Hiroaki
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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MATSUI Shinji
Faculty of Engineering Science, Osaka University
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YAMATO Toshiya
Matsushita Electronics Corporation
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Nishimura Tadashi
Faculty Of Engineering Science Osaka University
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YAMATO Toshiya
Faculty of Engineering Science, Osaka University
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Masuda Noboru
Faculty Of Engineering Science Osaka University
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Aritome Hiroaki
Faculty Of Engineering Science Osaka University
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Zeng G‐m
Hunan Univ. Changsha Chn
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Namba Susumu
The Institute Of Physical And Chemical Research
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DAIDO Hiroyuki
Institute of Applied Physics and Computational Mathematics
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MASUDA Kohzoh
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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NAMBA Susumu
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Zeng Guang-ming
Institute Of Laser Engineering Osaka University
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Nakai Sadao
Institute of Laser Engineering, Osaka University
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Daido Hiroyuki
Institute Of Laser Engineering Osaka University
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NAKATSUKA Masahiro
Institute of Laser Engineering, Osaka University
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NAGATA Hiroshi
Research Laboratory, Nikon Corporation
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Nakamura Takehiro
Faculty Of Engineering Science Osaka University
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Masuda Kohzoh
Department Of Electric Engineering Faculty Of Engineering Science Osaka University
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NAKAYAMA Shigeru
Research Center for Extreme Materials, Faculty of Engineering Science, Osaka University
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HARAMURA Kazuhito
Research Center for Extreme Materials, Faculty of Engineering Science, Osaka University
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KATAKURA Norihiro
Research Laboratories, Nikon Corporation
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ARITOME Hiroaki
Research Center for Extreme Materials, Faculty of Engineering Science, Osaka University
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Nakatsuka Masahiro
Institute Of Laser Engineering Osaha University
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Nakai Sadao
Institute Of Laser Engineering Osaka University
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Namba Susumu
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Hasegawa Shinya
Faculty Of Engineering Science Osaka University
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NISHIMURA Tadashi
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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SAKANO Kiyoji
Faculty of Engineering Science, Osaka University
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KARAPIPERIS Leonidas
Physics Department and National Research and Resource Facility for Submicron Structures, Cornell Uni
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ARITOME Hiroaki
The Institute of Physical and Chemical Research
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IKEGAMI Takanobu
Faculty of Engineering Science, Osaka University
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Katakura Norihiro
Research Laboratories Nikon Corporation
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Haramura Kazuhito
Research Center For Extreme Materials Faculty Of Engineering Science Osaka University
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Nagata Hiroshi
Research Laboratories Nikon Corporation
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Ikegami Takanobu
Faculty Of Engineering Science Osaka University
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Nakayama Shigeru
Research Center For Extreme Materials Faculty Of Engineering Science Osaka University:(present Addre
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Sakano Kiyoji
Faculty Of Engineering Science Osaka University:(present Address) Sharp Corporation Integrated Circu
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Nakai Sadao
Institute Of Laser Engineering Faculty Of Engineering Osaka University
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Mizuki Sin'ya
Nippon Soken
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Daido Hiroyuki
Institute for Chemical Research, Kyoto University, Gokasho, Uji, Kyoto 611-0011, Japan
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Nakatsuka Masahiro
Institute for Laser Technology, 1-8-4 Utsubo-Honmachi, Nishi-ku, Osaka 550-0004, Japan
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KARAPIPERIS Leonidas
Physics Department and National Research and Resource Facility for Submicron Structures, Cornell University
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Nakayama Shigeru
Research Center for Advanced Science and Technology, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8094, Japan
著作論文
- Zone-Plate X-Ray Microscope Using a Laser Plasma Source
- Optical Waveguiding and Electrooptic Modulation in Ion-Implanted CdTe
- A Loss Mechanism in Optical Waveguides Fabricated by Ion Implantation in Fused Quartz
- Optical Waveguides Fabricated by B Ion Implanted into Fused Quartz
- Internal Q-Switching in a CdS Laser Pumped by an Electron Beam
- A Large Time Delay of the Stimulated Emission in CdS Laser Pumped by an Electron Beam
- Contrast of the X-Ray Mask for Synchrotron Radiation and the Characteristics of Replicated Pattern
- A Blazed Si Grating for Soft X-Ray Fabricated by Two-Stage Reactive Ion-Beam Etching
- Graphoepitaxy of Ge Films on SiO_2 by Zone Melting Recrystallization
- Fabrication of 80 nm-Wide Lines in FPM Resist by H^+ Beam Exposure
- Fabrication of Si0_2 Grating Patterns with Vertical Sidewalls by S0R X-Ray Lithography and Reactive Ion-Beam Etching
- Etched Profile of Si by Ion-Bombardment-Enhanced Etching
- Reactive Ion-Beam Etching of Silicon Carbide
- Microfabrication of LiNbO_3 by Reactive Ion-Beam Etching
- Fabrication of SiO_2 Blazed Holographic Gratings by Reactive Ion-Etching
- Fabrication of a Grating Pattern with Submicrometer Dimension in Silicon Crystal by Ion-Bombardment-Enhanced Etching