Moriwaki K | Ntt Applied Electronics Laboratories

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概要

• 同名の論文著者
• Ntt Applied Electronics Laboratoriesの論文著者

関連著者

• Moriwaki Kazuyuki

  Faculty Of Engineering Science Osaka University:(present Address) Electrical Communication Laborator

• Moriwaki K

  Ntt Applied Electronics Laboratories

• Murakami Toshiaki

  Ibaraki Electrical Communication Laboratory Nippon Telephone And Telegraph Public Corporation

• Namba Susumu

  Faculty Of Engineering Science Osaka University

• Namba Susumu

  Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University

• Murakami T

  Department Of Applied Physics School Of Engineering The University Of Tokyo

• Aritome H

  Research Center For Extreme Materials Faculty Of Engineering Science Osaka University

• Aritome Hiroaki

  Faculty Of Engineering Osaka University

• Namba Susumu

  Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University

• Suzuki M

  Tohoku Univ. Sendai Jpn

• Suzuki Minoru

  Ntt Electrical Communications Laboratories

• Suzuki Minoru

  Ntt Laboratories

• MURAKAMI Toshiaki

  NTT Opto-Electronics Laboratory

• ENOMOTO Youichi

  NTT Opto-Electronics Laboratories

• Matsui Shinji

  Nippon Electric Co. Ltd

• Masuda Noboru

  Faculty Of Engineering Science Osaka University

• MURAKAMI Toshiaki

  NTT Electrical Communication Laboratories

• SUZUKI Minoru

  Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation

• MURAKAMI Toshiaki

  Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation

• ENOMOTO Youichi

  NTT Electrical Communications Laboratories

• MORIWAKI Kazuyuki

  NTT Electrical Communications Laboratories

• MORIWAKI Kazuyuki

  Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation

• MORIWAKI Kazuyuki

  NTT Opto-Electronics Laboratories

• Murakami Toshiaki

  Ibaraki Electrical Communication Laboratories Ntt

• MATSUI Shinji

  Faculty of Engineering Science, Osaka University

• Murakami Toshiaki

  Ntt Opto-electronics Laboratories

• Suzuki Minoru

  Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

• Suzuki Minoru

  Ibaraki Electrical Communication Laboratory Nippon Telegraph & Telephone Public Corporation

• Murakami Toshiaki

  Ibaraki Electrical Commuication Laboratory Nippon Telegraph And Telephone Public Corporation

• Nakamura Takehiro

  Faculty Of Engineering Science Osaka University

• KUBO Shugo

  NTT Opto-Electronics Laboratories

• Suzuki Minoru

  Ntt Electrical Communication Laboratories

• Hasegawa Shinya

  Faculty Of Engineering Science Osaka University

• ENOMOTO Youichi

  NTT Laboratories

• MURAKAMI Toshiaki

  NTT Laboratories

• MORIWAKI Kazuyuki

  NTT Laboratories

• Enomoto Youichi

  Ntt Applied Electronics Laboratories

• SAKANO Kiyoji

  Faculty of Engineering Science, Osaka University

• KARAPIPERIS Leonidas

  Physics Department and National Research and Resource Facility for Submicron Structures, Cornell Uni

• MORIWAKI Kazuyuki

  NTT Applied Electronics Laboratories

• Sakano Kiyoji

  Faculty Of Engineering Science Osaka University:(present Address) Sharp Corporation Integrated Circu

• KARAPIPERIS Leonidas

  Physics Department and National Research and Resource Facility for Submicron Structures, Cornell University

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著作論文

• Largely Anisotropic Superconducting Critical Current in Epitaxially Grown Ba_2YCu_3O_ Thin Film
• Electromagnetic Coupling Effects in BaPb_Bi_O_3 Two-Dimensional Josephson Tunnel Junction Arrays
• A Novel Discrete Current Behavior in the Current-Voltage Curve for Superconducting BaPb_Bi_O_3 Films
• As-Deposited Superconducting Ba_2YCu_3O_ Films Using ECR Ion Beam Oxidation : Electrical Properties of Condensed Matter
• Anisotropic Properties of Superconducting (La_Sr_x)_2 CuO_4 Single-Crystal Thin Films
• Contrast of the X-Ray Mask for Synchrotron Radiation and the Characteristics of Replicated Pattern
• Graphoepitaxy of Ge Films on SiO_2 by Zone Melting Recrystallization
• Fabrication of 80 nm-Wide Lines in FPM Resist by H^+ Beam Exposure
• Fabrication of Si0_2 Grating Patterns with Vertical Sidewalls by S0R X-Ray Lithography and Reactive Ion-Beam Etching
• Etched Profile of Si by Ion-Bombardment-Enhanced Etching
• Fabrication of a Grating Pattern with Submicrometer Dimension in Silicon Crystal by Ion-Bombardment-Enhanced Etching
• Electrical Properties of Boundary between YBa_2Cu_3O_ and Ba_K_xBiO_3 Thin Films
• Ba_K_xBiO_3 Thin Film Preparation by ECR Ion-Beam Oxidation, and Film Properties
• Josephson Junctions Observed in La_Sr_CuO_4 Superconducting Polycrystalline-Films

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