Moriwaki Kazuyuki | Faculty Of Engineering Science Osaka University:(present Address) Electrical Communication Laborator
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概要
- 同名の論文著者
- Faculty Of Engineering Science Osaka University:(present Address) Electrical Communication Laboratorの論文著者
関連著者
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Moriwaki Kazuyuki
Faculty Of Engineering Science Osaka University:(present Address) Electrical Communication Laborator
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Moriwaki K
Ntt Applied Electronics Laboratories
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Murakami Toshiaki
Ibaraki Electrical Communication Laboratory Nippon Telephone And Telegraph Public Corporation
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Namba Susumu
Faculty Of Engineering Science Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Murakami T
Department Of Applied Physics School Of Engineering The University Of Tokyo
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Aritome H
Research Center For Extreme Materials Faculty Of Engineering Science Osaka University
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Aritome Hiroaki
Faculty Of Engineering Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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Suzuki M
Tohoku Univ. Sendai Jpn
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Suzuki Minoru
Ntt Electrical Communications Laboratories
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Suzuki Minoru
Ntt Laboratories
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MURAKAMI Toshiaki
NTT Opto-Electronics Laboratory
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ENOMOTO Youichi
NTT Opto-Electronics Laboratories
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Matsui Shinji
Nippon Electric Co. Ltd
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Masuda Noboru
Faculty Of Engineering Science Osaka University
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MURAKAMI Toshiaki
NTT Electrical Communication Laboratories
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SUZUKI Minoru
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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MURAKAMI Toshiaki
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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ENOMOTO Youichi
NTT Electrical Communications Laboratories
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MORIWAKI Kazuyuki
NTT Electrical Communications Laboratories
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MORIWAKI Kazuyuki
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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MORIWAKI Kazuyuki
NTT Opto-Electronics Laboratories
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Murakami Toshiaki
Ibaraki Electrical Communication Laboratories Ntt
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MATSUI Shinji
Faculty of Engineering Science, Osaka University
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Murakami Toshiaki
Ntt Opto-electronics Laboratories
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Suzuki Minoru
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Suzuki Minoru
Ibaraki Electrical Communication Laboratory Nippon Telegraph & Telephone Public Corporation
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Murakami Toshiaki
Ibaraki Electrical Commuication Laboratory Nippon Telegraph And Telephone Public Corporation
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Nakamura Takehiro
Faculty Of Engineering Science Osaka University
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KUBO Shugo
NTT Opto-Electronics Laboratories
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Suzuki Minoru
Ntt Electrical Communication Laboratories
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Hasegawa Shinya
Faculty Of Engineering Science Osaka University
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ENOMOTO Youichi
NTT Laboratories
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MURAKAMI Toshiaki
NTT Laboratories
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MORIWAKI Kazuyuki
NTT Laboratories
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Enomoto Youichi
Ntt Applied Electronics Laboratories
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SAKANO Kiyoji
Faculty of Engineering Science, Osaka University
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KARAPIPERIS Leonidas
Physics Department and National Research and Resource Facility for Submicron Structures, Cornell Uni
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MORIWAKI Kazuyuki
NTT Applied Electronics Laboratories
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Sakano Kiyoji
Faculty Of Engineering Science Osaka University:(present Address) Sharp Corporation Integrated Circu
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KARAPIPERIS Leonidas
Physics Department and National Research and Resource Facility for Submicron Structures, Cornell University
著作論文
- Largely Anisotropic Superconducting Critical Current in Epitaxially Grown Ba_2YCu_3O_ Thin Film
- Electromagnetic Coupling Effects in BaPb_Bi_O_3 Two-Dimensional Josephson Tunnel Junction Arrays
- A Novel Discrete Current Behavior in the Current-Voltage Curve for Superconducting BaPb_Bi_O_3 Films
- As-Deposited Superconducting Ba_2YCu_3O_ Films Using ECR Ion Beam Oxidation : Electrical Properties of Condensed Matter
- Anisotropic Properties of Superconducting (La_Sr_x)_2 CuO_4 Single-Crystal Thin Films
- Contrast of the X-Ray Mask for Synchrotron Radiation and the Characteristics of Replicated Pattern
- Graphoepitaxy of Ge Films on SiO_2 by Zone Melting Recrystallization
- Fabrication of 80 nm-Wide Lines in FPM Resist by H^+ Beam Exposure
- Fabrication of Si0_2 Grating Patterns with Vertical Sidewalls by S0R X-Ray Lithography and Reactive Ion-Beam Etching
- Etched Profile of Si by Ion-Bombardment-Enhanced Etching
- Fabrication of a Grating Pattern with Submicrometer Dimension in Silicon Crystal by Ion-Bombardment-Enhanced Etching
- Electrical Properties of Boundary between YBa_2Cu_3O_ and Ba_K_xBiO_3 Thin Films
- Ba_K_xBiO_3 Thin Film Preparation by ECR Ion-Beam Oxidation, and Film Properties
- Josephson Junctions Observed in La_Sr_CuO_4 Superconducting Polycrystalline-Films