Yamamoto K | Storage Media Systems Development Center Matsushita Elec. Ind. Co. Ltd.
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概要
- Yamamoto Kazuoの詳細を見る
- 同名の論文著者
- Storage Media Systems Development Center Matsushita Elec. Ind. Co. Ltd.の論文著者
関連著者
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Yamamoto K
Storage Media Systems Development Center Matsushita Elec. Ind. Co. Ltd.
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Yamamoto K
Kobayasi Institute Of Physical Research
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Mizuuchi Kiminori
Storage Media Systems Development Center Matsushita Elec. Ind. Co. Ltd.
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Kitaoka Y
Storage Media Systems Development Center Matsushita Elec. Ind. Co. Ltd.
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KITAOKA Yasuo
Storage Media Systems Development Center, Matsushita Elec. Ind. Co., Ltd.
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高木 堅志郎
東大 生産技研
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YAMAMOTO Kazuhisa
Storage Media Systems Development Center, Matsushita Electric Industrial Co. Ltd.
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高木 堅志郎
東大生研
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高木 堅志郎
東大・生研
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SAKAI Keiji
Institute of Industrial Science, University of Tokyo
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TAKAGI Kenshiro
Institute of Industrial Science, University of Tokyo
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Kato M
Kyoto Univ. Kyoto Jpn
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YAMAMOTO Kazuko
Advanced LSI Technology Laboratory, Toshiba Corporation
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UNO Taiga
Advanced LSI Technology Laboratory, Toshiba Corporation
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Sakai Kiyomi
Kansai Advanced Research Center Communications Research Laboratory The Ministry Of Posts And Telecom
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KOKUBO Akira
Institute of Industrial Science, University of Tokyo
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TANJI Takayoshi
Department of Electronics, Nagoya University
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Kokubo Akira
Univ. of Tokyo
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MIZUUCHI Kiminori
Storage Media Systems Development Center, Matsushita Electric Industrial Co. Ltd.
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YAMAMOTO Ken
Institute of Industrial Science, University of Tokyo
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MIZUUCHI Kiminori
Optical Disk Systems Development Center, Matsushita Electric Industrial Co., Ltd.
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KITAOKA Yasuo
Optical Disk Systems Development Center, Matsushita Electric Industrial Co., Ltd.
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YAMAMOTO Kazuhisa
Optical Disk Systems Development Center, Matsushita Electric Industrial Co., Ltd.
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Sakai K
宮崎大
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Sakai Keiji
Institute Of Industrial Science University Of Tokyo
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Takagi Kenshiro
Institute Of Industrial Science University Of Tokyo
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Hirayama T.
Japan Fine Ceramics Center
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Uno T
Kanagawa Inst. Technol. Kanagawa Jpn
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Kitaoka Yasuo
Optical Disk Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Hirayama T
Japan Fine Ceramics Center Nagoya Jpn
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Tanji T
Nagoya Univ. Nagoya Jpn
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Yamamoto Kazuhisa
Optical Devices Research Laboratory Components And Devices Research Center Matsushita Electric Indus
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Takagi Kenshiro
Institute Of Industrial Science The University Of Tokyo
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Yamamoto Ken
Institute Of Industrial Science The University Of Tokyo
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Mizuuchi Kiminori
Optical Disk Systems Development Center, Matsushita Electric Industrial Co. , Ltd.
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齋川 次郎
分子科学研究所分子制御レーザー開発研究センター
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TAIRA Takunori
Laser Research Center, Institute for Molecular Science
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Kobayashi Sota
Silicon Systems Research Laboratories Nec Corporation
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日比野 倫夫
日本電子顕微鏡学会名古屋大学理工科学総合研究センター
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Mori Y
Research Center For Ultra-precision Science And Technology Graduate School Of Engineering Osaka Univ
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Kotani Toshiya
Microelectronics Laboratory Toshiba Corporation
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Mori Yusuke
Graduate School of Engineering, Osaka University
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Okano M
Nalux Co. Ltd.
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KIKUTA Hisao
Department of Mechanical Systems Engineering, College of Engineering, Osaka Prefecture Universit
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HIRAI Yoshihiko
Department of Mechanical Systems Engineering, College of Engineering, Osaka Prefecture Universit
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Mori Yoshihiro
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Inoue S
Toshiba Corp. Kawasaki Jpn
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Mori Yoshihiro
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.
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Shibata J
Japan Fine Ceramic Center Nagoya Jpn
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Kobayashi S
Science University Of Tokyo In Yamaguchi
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Kobayashi Shunsuke
Department Of Electronic Engineering (div. Of Engineering Sciences) Faculty Of Technology Tokyo Univ
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Kobayashi S
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology(aist)
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TSUZUMITANI Akihiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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Okuno Yasutoshi
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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OKUNO Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.
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SHIBATA Jun
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
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SHIMIZU Tadami
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
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YAMAMOTO Kazuhiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
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Inoue Seiji
Mirai Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And T
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Morikawa Akihiro
Storage Media Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Mori Y
Osaka Univ. Suita Jpn
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Hirayama Tsukasa
Japan Fine Ceramics Center
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Shimizu T
Univ. Occupational And Environmental Health Jpn
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Tanaka S
International Superconductivity Technol. Center Tokyo Jpn
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Kotani Tsuyoshi
Fujitsu Laboratories Limited
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Pavel Nicolaie
Laser Research Center Institute For Molecular Science
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TANAKA Satoshi
Advanced LSI Technology Laboratory, Toshiba Corporation
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KOBAYASHI Sachiko
Advanced LSI Technology Laboratory, Toshiba Corporation
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INOUE Soichi
Microelectronics Laboratory, Toshiba Corporation
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Ohno Masahiro
Chiba Institute of Technology
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Yokoyama Toshifumi
Storage Media Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Kobayashi Shunsuke
Science University Of Tokyo
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Kobayashi Shunsuke
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology(aist)
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Shimizu Tadao
Department Of Physics University Of Tokyo
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Yotsuya Tsutomu
Technology Research Institute Of Osaka Prefecture
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Shimizu T
Department Of Electrical And Electronic Engineering Kanazawa University
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Okuno Y
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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YAMAMOTO Ken
Kobayasi Institute of Physical Research
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YAMAMOTO Kazuo
Japan Society for the Promotion of Science
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MIYASHITA Kimiya
Japan Fine Ceramics Center
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SUGITA Tomoya
Storage Media Systems Development Center, Matsushita Electric Industrial Co. Ltd.
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Kobayashi Shunsuke
Liquid Crystal Institute Science University Of Tokyo In Yamaguchi
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Yokoyama T
Storage Media Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Shimizu T
Faculty Of Engineering Chiba University
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Ohno M
Chiba Institute Of Technology
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Kitaoka Yasuo
Storage Media Systems Development Center Matsushita Elec. Ind. Co. Ltd.
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Kotani Tokumi
Microelectronics Laboratory Toshiba Corporation
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Shimizu T
Chiba Univ. Chiba Jpn
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KATO Makoto
Materials and Devices Laboratory, Matsushita Electric Industrial Co. Ltd.
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奥野 泰利
日本テキサスインスツルメンツ(株)、ulsi技術開発センター
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奥野 泰利
松下電器産業(株)
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KITAOKA Yasuo
Materials and Devices Laboratory, Matsushita Electric Industrial Co., Ltd.
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MIZUUCHI Kiminori
Materials and Devices Laboratory, Matsushita Electric Industrial Co., Ltd.
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YAMAMOTO Kazuhisa
Materials and Devices Laboratory, Matsushita Electric Industrial Co., Ltd.
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Kobayashi Shun-ichi
Department Of Physics School Of Science University Of Tokyo
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Kotani T
Microelectronics Laboratory Toshiba Corporation
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Kato Makoto
Materials And Devices Laboratory Matsushita Electric Industrial Co. Ltd.
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Yokoyama T
Tokai Univ. Kanagawa Jpn
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Mizuuchi Kiminori
Materials And Devices Laboratory Matsushita Electric Industrial Co. Ltd.
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Tsuzumitani Akihiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Tsuzumitani Akihiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Kobayashi Shunichi
Department Of Physics Graduate School Of Science The University Of Tokyo
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Mori Yuzo
Department Of Mechanical Engineering Kochi National College Of Technology
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Yamamoto Kazuhisa
Materials And Devices Laboratory Matsushita Electric Industrial Co. Ltd.
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Shibata Jun
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Yamamoto Kazuhiko
ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd., 19 Nishikujo-Kasugacho, Minami-ku, Kyoto 601-8413, Japan
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KOBAYASHI Shun-ichi
Faculty of Engineering Science, Osaka University:(Present address)Department of Physics, University of Tokyo
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Okuno Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp., 19, Nishikujo-kasuga cho, Minami-ku, Kyoto 601-8413, Japan
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Yamamoto Kazuhiko
ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.
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Kobayashi Shunichi
Department of Physics, Faculty of Science, University of Tokyo
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平井 義彦
大阪府立大学大学院工学研究科
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高木 堅志郎
東京大学生産技術研究所
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Tsukada Keiji
筑波大学 循環器内科
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菊田 久雄
大阪府大
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菊田 久雄
大阪府立大学工学研究科
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OKANO Masato
New Technology Development Group, NALUX Co., Ltd.
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YAMAMOTO Kazuya
New Technology Development Group, NALUX Co., Ltd.
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YOTSUYA Tsutom
Technology Research Institute of Osaka Prefecture
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OKANO Masato
Osaka Science and Technology Center
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YOTSUYA Tsutomu
Osaka Science and Technology Center
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YAMAMOTO Kazuya
Nalux Co. Ltd.
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YAMAMOTO Kazuo
Department of Clinical Laboratory Medicine, Shiga University of Medical Science
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TANJI Takayoshi
Center for Integrated Research in Science and Engineering. Nagoya University
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SAITO Tomohiro
Japan Fine Ceramics Center
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KATO Takahiro
Faculty of Textile Science and Technology, Shinshu University
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Tanaka Satoshi
Microelectronics Engineering Laboratory, Toshiba Corporations Semiconductor Company
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Higurashi Hitoshi
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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Watanabe Susumu
DA Engineering Department, Micro & Custom LSI Division, Toshiba Corporation Semiconductor Company
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Yano Mitsuhiro
DA Engineering Department, Micro & Custom LSI Division, Toshiba Corporation Semiconductor Company
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Ohki Shinichiro
Toshiba Microelectronics Corporation
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Tsunakawa Kiyoshi
Toshiba Microelectronics Corporation
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平井 義彦
大阪府立大学 大学院工学研究科 電気・情報系専攻
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Yamamoto Kotaro
Second Department Of Surgery Yamaguchi University School Of Medicine
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OHNO Masahiro
Faculty of Engineering, Chiba Institute of Technology
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Kato Takahiro
Chiba Institute of Technology
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SHOJI Ichiro
Laser Research Center, Institute for Molecular Science
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KANDA Osamu
Institute of Industrial Science, University of Tokyo
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SUGITA Tomoya
Optical Disk Systems Development Center, Matsushita Electric Industrial Co., Ltd.
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AOYAMA Naoto
School of Engineering, Nagoya University
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YAMAMOTO Kazuo
School of Engineering, Nagoya University
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TANJI Takayoshi
CIRSE, Nagoya University
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HIBINO Michio
CIRSE, Nagoya University
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YOKOYAMA Toshifumi
Optical Disk Systems Development Center, Matsushita Electric Industrial Co. , Ltd.
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KAWAJIRI Ikuo
Department of Electronics Nagoya University
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HIBINO Michio
Center for Integrated Research in Science & Engineering Nagoya University
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Kanda Osamu
Institute Of Industrial Science University Of Tokyo
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NISHINO Seiji
Optical Disk Systems Development Center, Matsushita Electric Industrial Co. Ltd.
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Sugita Tomoya
Storage Media Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Nishino Seiji
Optical Disc Systems Development Center. Matsushita Electric Industrial Co. Ltd.
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Yano Mitsuhiro
Da Engineering Department Micro & Custom Lsi Division Toshiba Corporation Semiconductor Company
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Shimizu Tatsuo
Faculty Of Technology
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Hirai Y
College Of Engineering Graduate School Of Osaka Prefecture University
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Higurashi Hitoshi
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Taira Takunori
Laser Research Center For Molecular Science Institute For Molecular Science
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Aoyama Naoto
School Of Engineering Nagoya University
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KOYAMA Kiyomi
Semiconductor DA & Test Engineering Center, Toshiba Corporation
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KATO Makoto
Optical Disk Systems Development Center, Matsushita Electric Industrial Co., Ltd.
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Kikuta Hisao
Department Of Mechanical Engineering College Of Engineering University Of Osaka Prefecture
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Kasazumi Ken’ichi
Storage Media Systems Development Center, Matsushita Elec. Ind. Co., Ltd., 3-1-1 Yagumo-Nakamachi, M
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WADA Hidehiko
Optical Disk Systems Development Center, Matsushita Electric Industrial Co., Ltd.
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OHNO Masahiro
Olympus Optical Company, Ltd.
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Wada Hidehiko
Optical Disk Systems Development Center Matsushita Electric Industrial Co. Ltd.
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HARA Hisako
Materials and Devices Laboratory, Matsushita Electric Industrial Co., Ltd.
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Hara Hisako
Materials And Devices Laboratory Matsushita Electric Industrial Co. Ltd.
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Kasazumi Ken'ichi
Storage Media Systems Development Center Matsushita Elec. Ind. Co. Ltd.
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Yano Makoto
Department Of Electrical Engineering Faculty Of Engineering Ibaraki University
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Saito Tomohiro
Japan Fine Ceramics Center Nagoya Jpn
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Yamamoto Kazuo
Department Of Biomolecular Sciences Graduate School Of Life Sciences Tohoku University
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Shimizu Tadao
Department Of Industrial Chemistry Chiba Institute Of Technology
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Shimizu Tadao
Department Of Physics Faculty Of Science The University Of Tokyo
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Hirai Yoshihiko
Department Of Bioscience And Biotechnology Faculty Of Agriculture Shinshu University
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Tanji Takayoshi
Department Of Applied Physics Osaka University
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Watanabe Susumu
Da Engineering Department Micro & Custom Lsi Division Toshiba Corporation Semiconductor Company
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Tanaka Satoshi
Microelectronics Engineering Laboratories Toshiba Corporation
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Yotsuya Tsutomu
Osaka Prefectural Industrial Research Institute, Enokojima, Nishiku, Osaka 550
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Yamamoto Kazuo
Department of Biology, Chiba University
著作論文
- Proximity Correction for Fabricating a Chirped Diffraction Grating by Direct-Writing Electron-Beam Lithography
- Automatic Dose Optimization System for Resist Cross-Sectional Profile in a Electron Beam Lithography
- Extendibility of Ta_2O_5 Metal-Insulator-Metal Capacitor Using Ru Electrode
- Ru-Ta_2O_5MIM Capacitor toward 0.1μm DRAM Cell
- Highly Accurate Process Proximity Correction Based on Empirical Model for 0.18 μm Generation and Beyond
- Development of An Accurate Optical Proximity Correction System for 1 Gbit Dynamic Random Access Memory Fabrication
- Reflection-Type Ultrasonic Phase Conjugate Imaging System with a Waveguide
- Amplitude-division three-electron-wave interference for observing pure phase objects having low spatial frequency
- Direct observation of electrostatic microfields by four-electron-wave interference using two electron biprisms
- P2-40 Effect of a Waveguide in the Ultrasonic Phase Conjugate Imaging System(Short presentation for poster)
- Continuous-Wave Deep Blue Generation in a Periodically Poled MgO:LiNbO_3 Crystal by Single-Pass Frequency Doubling of a 912-nm Nd:GdVO_4 Laser
- A Practical Laser Projector with New Illumination Optics for Reduction of Speckle Noise
- High-Power Continuous Wave Green Generation by Single-Pass Frequency Doubling of a Nd : GdVO_4 Laser in a Periodically Poled MgO : LiNbO_3 Operating at Room Temperature
- New Passive Alignment Method of Channel Waveguide Device Using Height Control Spacers
- Estimation of Nonlinear Piezoelectricity of 0.5Pb(Ni_Nb_)O_3-0.35PbTiO_3-0.l5PbZrO_3 and 0.64Pb(Ni_Nb_)O_3-0.36PbTiO_3Ceramics
- Observation of Acoustic Diffusion Wave(Structure and Mechanical and Thermal Properties of Condensed Matter)
- Ultraviolet Light Generation in a Periodically Poled MgO:LiNbO_3 Waveguide
- Computational Fresnel Images of Magnetic Nanoparticles
- Miniaturized Blue Laser using Second Harmonic Generation
- High precision phase-shifting electron holography
- Hierarchical Processing of Levenson-Type Phase Shifter Generation
- Efficient Planar-Type Butt Coupling of a Proton-Exchanged Waveguide on a Z-Cut LiTaO_3 Substrate
- Nonlinear Piezoelectricity of PZT Ceramics and Acoustic Phase Conjugate Waves
- Frequency Doubling of Wavelength Locked Laser Diode with a Transmission-Type Filter in a Confocal Optical Configuration
- Frequency Doubling of a Laser Diode Using a Domain-Inverted LiTaO_3 Waveguide with a Monolithic Bragg Reflector