Proximity Correction for Fabricating a Chirped Diffraction Grating by Direct-Writing Electron-Beam Lithography
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-09-15
著者
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Okano M
Nalux Co. Ltd.
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OKANO Masato
New Technology Development Group, NALUX Co., Ltd.
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KIKUTA Hisao
Department of Mechanical Systems Engineering, College of Engineering, Osaka Prefecture Universit
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HIRAI Yoshihiko
Department of Mechanical Systems Engineering, College of Engineering, Osaka Prefecture Universit
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YAMAMOTO Kazuya
New Technology Development Group, NALUX Co., Ltd.
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YOTSUYA Tsutom
Technology Research Institute of Osaka Prefecture
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Yotsuya Tsutomu
Technology Research Institute Of Osaka Prefecture
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Yamamoto K
Storage Media Systems Development Center Matsushita Elec. Ind. Co. Ltd.
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