Effects of Nitrogen Pressure and RF Power on the Properties of Reactive Magnetron Sputtered Zr-N Films and an Application to a Thermistor
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-12-15
著者
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YOTSUYA Tsutom
Osaka Prefectural Industrial Technology Research Institute
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Yoshitake Masaaki
Osaka Prefectural Industrial Technology Research Institute
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Yotsuya Tsutomu
Technology Research Institute Of Osaka Prefecture
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Yotsuya Tsutom
Osaka Prefectural Industrial Technology Research Insitute
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OGAWA Souichi
Technology Research Institute of Osaka Prefecture
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Yotsuya T
Technology Research Institute Of Osaka Prefecture
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OGAWA Soichi
Osaka Prefectural Industrial Technology Research Institute
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Ogawa S
Toho Univ. Chiba Jpn
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Yoshitake M
Technol. Res. Inst. Osaka Prefecture Osaka
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