OGAWA Soichi | Osaka Prefectural Industrial Technology Research Institute
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概要
関連著者
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OGAWA Soichi
Osaka Prefectural Industrial Technology Research Institute
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SUZUKI Yoshihiko
Osaka Prefectural Industrial Technology Research Institute
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Yotsuya Tsutom
Osaka Prefectural Industrial Technology Research Insitute
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YOTSUYA Tsutom
Osaka Prefectural Industrial Technology Research Institute
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Yoshitake Masaaki
Osaka Prefectural Industrial Technology Research Institute
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Yotsuya Tsutomu
Technology Research Institute Of Osaka Prefecture
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OGAWA Souichi
Technology Research Institute of Osaka Prefecture
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Yotsuya T
Technology Research Institute Of Osaka Prefecture
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Ogawa S
Toho Univ. Chiba Jpn
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Shoji Fumiya
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Hanawa Teruo
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Oura Kenjiro
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Nagasaka Takeshi
Technology Research Institute Of Osaka Prefecture
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Naito Makio
Joining and Welding Research Institute, Osaka University
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YOTSUYA Tsutomu
Osaka Science and Technology Center
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Naito M
Hosokawa Micron Co. Ltd.
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Naito Makio
Hosokawa Micron Corp.
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Aoki Akira
Osaka Prefectural Industrial Reseach Institute Enkojima
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KUSAKA Tadaoki
Osaka Prefectural Industrial Technology Research Institute
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AOYAMA Takahiro
Daihen Co.
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Naito Makio
Joining And Wielding Research Institute Osaka University
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Naito Makio
Hosokawa Micron Co. Ltd.
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SUZUKI Yoshifumi
NTT Electrical Communications Laboratories
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Suzuki Yoshifumi
Department Of Materials Science Faculty Of Engineering Kyushu Institute Of Technology
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Suzuki Yoshishige
Joint Research Center For Atom Technology(jrcat)-national Institute For Advanced Interdisciplinary R
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Suzuki Yasuzou
Nanotechnology Research Institute National Institute Of Advanced Industrial Science And Technology
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IMOKAWA Hirofumi
Tatsuta Electric Wire & Cable Co., Ltd.
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YOSHIKAWA Masahiro
Hosokawa Micron Co. Ltd.
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TAKAHATA Ryoichi
Koyo Seiko Co., Ltd.
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OTANI Kohei
Hitachi Zosen Technical Research Laboratory Inc.
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Okamoto Akio
Osaka Prefectural Industrial Technology Research Institute
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Takahata Ryoichi
Koyo Seiko Co. Ltd.
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NOSAKA Toshikazu
Osaka Prefectural Industrial Technology Research Institute
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Imokawa H
Tatsuta Electric Wire & Cable Co. Ltd.
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Yoshitake M
Technol. Res. Inst. Osaka Prefecture Osaka
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Suzuki Yoshihiko
Osaka Prefectural Industrial Technology Research Institute, 2-1-53 Enokojima, Nishiku, Osaka 550
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Suzuki Yoshihiko
Osaka Prefecture Industrial Technology Research Institute, 2-1-53, Enokogima, Nishi-ku, 550 Osaka
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Taniguchi Hideki
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Yamada-Oka, Suita, Osaka 565
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Kusumoto Osamu
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Yamada-Oka, Suita, Osaka 565
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Aoki Akira
Osaka Prefectural Industrial Technology Research Institute, 2-1-53 Enokojima, Nishiku, Osaka 550
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Watamori Michio
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Suita, Osaka 565
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Aoyama Takahiro
Daihen Co., Tagawa, Yodogawaku, Osaka 532
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Shoji Fumiya
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Yamada-Oka, Suita, Osaka 565
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Shoji Fumiya
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Suita, Osaka 565
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Hanawa Teruo
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Yamada-Oka, Suita, Osaka 565
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Hanawa Teruo
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Suita, Osaka 565
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Yotsuya Tsutom
Osaka Prefectural Industrial Technology Research Institute, 2-1-53 Enokojima, Nishiku, Osaka 550
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Yotsuya Tsutomu
Osaka Prefectural Industrial Research Institute, Enokojima, Nishiku, Osaka 550
著作論文
- Effects of Nitrogen Pressure and RF Power on the Properties of Reactive Magnetron Sputtered Zr-N Films and an Application to a Thermistor
- Fabrication of Bi(Pb)SrCaCuO Thin Film of High-T_c Phase
- Effects of Ion Species on Reactive-Ion-Beam-Sputtered Zr-N Films
- PIXE in Determination of Argon Impurity in Ion Beam Sputter-Deposited Co–Cr Films
- The Contact Resistance of the YBa2Cu3O7-δ-Metal Film System
- High-Energy Ion Beam Analysis of YBa2Cu3Ox Thin Films