Shoji Fumiya | Electron Beam Laboratory Faculty Of Engineering Osaka University
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概要
関連著者
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Shoji Fumiya
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Hanawa Teruo
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Oura Kenjiro
Electron Beam Laboratory Faculty Of Engineering Osaka University
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SHOJI Fumiya
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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HANAWA Teruo
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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OURA Kenjiro
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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Hanawa Teruo
Faculty Of Engineering Osaka University:osaka Institute Of Technology
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Shoji Fumiya
Faculty Of Engineering Osaka University
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Oura Kenjiro
Faculty Of Engineering Osaka University
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OGAWA Soichi
Osaka Prefectural Industrial Technology Research Institute
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KATAYAMA Itsuo
Department of Applied Physics, Faculty of General Education, Osaka Institute of Technology
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Katayama I
Department Of Applied Physics Faculty Of General Education Osaka Institute Of Technology
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Oura K
Research Center For Ultrahigh Voltage Electron Microscopy Osaka University
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Terashima Takahito
Institute for Chemical Research, Kyoto University
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Yamane Junji
Electron Beam Laboratory Faculty Of Engineering Osaka University
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YOTSUYA Tsutomu
Osaka Science and Technology Center
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WATAMORI Michio
Department of Electronic Engineering, Faculty of Engineering, Osaka University
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SUZUKI Yoshihiko
Osaka Prefectural Industrial Technology Research Institute
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Bando Yoshichika
Institute For Chemical Reaearch Kyoto University
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KUROI Takashi
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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UMEZAWA Kenji
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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Shoji F
Electron Engineering Faculty Of Engineering Osaka University
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Umezawa K
Osaka Prefecture Univ. Osaka Jpn
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Umezawa Kenji
Department Of Materials Science Osaka Prefecture University
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Kuroi Takashi
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Yabuuchi Yasufumi
Electron Beam Laboratory Faculty Of Engineering Osaka University
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KISHIKAWA Yozo
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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OKADA Satoshi
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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SAITOH Mitsuchika
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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Watamori Michio
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Kishikawa Yozo
Electron Beam Laboratory Faculty Of Engineering Osaka University:(present Address) Senboku Works Osa
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Saitoh Mitsuchika
Electron Beam Laboratory Faculty Of Engineering Osaka University
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WATAMORI Michio
Low Temperature Center, Osaka University
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Okada Satoshi
Electron Beam Laboratory Faculty Of Engineering Osaka University:(present Address) Department Of Res
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Terashima Takahito
Institute For Chemical Research Kyoto University
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Terashima Takahito
Institute For Chemical Reaearch Kyoto University
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Suzuki Yoshihiko
Osaka Prefecture Industrial Technology Research Institute, 2-1-53, Enokogima, Nishi-ku, 550 Osaka
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Taniguchi Hideki
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Yamada-Oka, Suita, Osaka 565
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Kusumoto Osamu
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Yamada-Oka, Suita, Osaka 565
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Watamori Michio
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Suita, Osaka 565
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Shoji Fumiya
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Yamada-Oka, Suita, Osaka 565
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Shoji Fumiya
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Suita, Osaka 565
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Hanawa Teruo
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Yamada-Oka, Suita, Osaka 565
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Hanawa Teruo
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Suita, Osaka 565
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Yotsuya Tsutomu
Osaka Prefectural Industrial Research Institute, Enokojima, Nishiku, Osaka 550
著作論文
- Ion Beam Analysis of the Concentration and Thermal Release of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD Method : Surfaces, Interfaces and Films
- An Interpretation of Discrete Energy Loss in He^+ Ion Scattering from W Surfaces Containing Oxygen
- Cylindrical Mirror Analyzer (CMA) with an Axially Integrated ISS-AES Gun for Surface Composition Analysis : Techniques, Instrumentations and Measurement
- Oxygen-Enhanced Surface Segregation of Mn in Cu-Mn and Ag-Mn Alloy Films Studied by ISS/AES : Surfaces, Interfaces and Films
- Detection of Hydrogen on Solid Surfaces by Low-Energy Recoil Ion Spectroscopy
- New Surface Structure of Pd on Si(111) Studied by Low-Energy Ion-Scattering Spectroscopy and LEED-AES
- Atomic Arrangement of the Si(111)-√×√-Ag Structure Derived from Low-Energy Ion-Scattering Spectroscopy
- Ion Channeling Study of SrTiO_3 Substrates and As-Deposited YBa_2Cu_3O_x Thin Films
- PIXE in Determination of Argon Impurity in Ion Beam Sputter-Deposited Co–Cr Films
- High-Energy Ion Beam Analysis of YBa2Cu3Ox Thin Films