Shoji Fumiya | Faculty Of Engineering Osaka University
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概要
関連著者
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Shoji Fumiya
Faculty Of Engineering Osaka University
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Oura Kenjiro
Faculty Of Engineering Osaka University
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Hanawa Teruo
Faculty Of Engineering Osaka University:osaka Institute Of Technology
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SHOJI Fumiya
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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OURA Kenjiro
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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HANAWA Teruo
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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Shoji Fumiya
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Hanawa Teruo
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Oura Kenjiro
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Shoji Fumiya
Department Of Applied Physics Faculty Of Engineering Kobe University
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KATAYAMA Itsuo
Department of Applied Physics, Faculty of General Education, Osaka Institute of Technology
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Oura Kenjiro
Department Of Elecronic Engineering Graduate School Of Engineering Osaka University
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Katayama I
Department Of Applied Physics Faculty Of General Education Osaka Institute Of Technology
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OURA Kenjiro
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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Oura K
Research Center For Ultrahigh Voltage Electron Microscopy Osaka University
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WATAMORI Michio
Department of Electronic Engineering, Faculty of Engineering, Osaka University
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Shoji Fumiya
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Shoji F
Electron Engineering Faculty Of Engineering Osaka University
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Umezawa K
Osaka Prefecture Univ. Osaka Jpn
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Umezawa Kenji
Department Of Materials Science Osaka Prefecture University
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Watamori Michio
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Itozaki Hideo
Itami Research Laboratories, Sumitomo Electric Industries, Ltd.
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Yamane Junji
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Itozaki Hideo
Itami Research Laboratories Sumitomo Electric Ind. Ltd.
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KUROI Takashi
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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UMEZAWA Kenji
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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Ohnishi Hiroaki
Fujitsu Laboratories Ltd.
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Ohnishi H
Taihei Kogyo Co. Ltd. Himeji Jpn
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Shoji Fumiya
Faculty Of Engineering Kyushu Kyoritsu University
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Shoji Fumiya
Faculty Of Engineering Kobe University
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Hanawa Teruo
Faculty Of Engineering Osaka University
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Kuroi Takashi
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Oura Kenjiro
Faculty Of Engineering Osaka Univetsity
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Ohnishi Hiroaki
Division Of Hematology Faculty Of Medicine Kagawa University
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HANAWA Teruo
Department of Information Systems Engineering, Faculty of Engineering, Osaka University
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Ohnishi Hideaki
Department Of Materials Science Faculty Of Engineering Toin University Of Yokohama
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Yabuuchi Yasufumi
Electron Beam Laboratory Faculty Of Engineering Osaka University
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UMEZAWA Kenji
Faculty of Engineering, Osaka University
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KISHIKAWA Yozo
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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OKADA Satoshi
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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SAITOH Mitsuchika
Electron Beam Laboratory, Faculty of Engineering, Osaka University
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OHBA Yasuyuki
Department of Applied Physics, Faculty of General Education, Osaka Institute of Technology
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Ohba Yasuyuki
Department Of Inorganic Materials Faculty Of Engineering Tokyo Institute Of Technology
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Kishikawa Yozo
Electron Beam Laboratory Faculty Of Engineering Osaka University:(present Address) Senboku Works Osa
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Saitoh Mitsuchika
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Okada Satoshi
Electron Beam Laboratory Faculty Of Engineering Osaka University:(present Address) Department Of Res
著作論文
- Methodology for Accurate Oxygen Distribution Analysis and Its Application to YBa_2Cu_3O_x Thin Films Using ^O(α, α)^O 3.045 MeV Resonance Reaction
- Ion Beam Analysis of the Concentration and Thermal Release of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD Method : Surfaces, Interfaces and Films
- Ion Channeling Study of Epitaxially Grown HoBa_2Cu_3O_x Thin Films on MgO(001)
- Elastic Recoil Detection Analysis of the Concentration and Thermal Release of Hydrogen in a-Si:H Films by the ECR Plasma CVD Method
- Cylindrical Mirror Analyzer (CMA) with an Axially Integrated ISS-AES Gun for Surface Composition Analysis : Techniques, Instrumentations and Measurement
- Oxygen-Enhanced Surface Segregation of Mn in Cu-Mn and Ag-Mn Alloy Films Studied by ISS/AES : Surfaces, Interfaces and Films
- Detection of Hydrogen on Solid Surfaces by Low-Energy Recoil Ion Spectroscopy
- New Surface Structure of Pd on Si(111) Studied by Low-Energy Ion-Scattering Spectroscopy and LEED-AES
- Atomic Arrangement of the Si(111)-√×√-Ag Structure Derived from Low-Energy Ion-Scattering Spectroscopy
- Growth Processes of Si(111)-√×√-Ag Studied by Scanning Tunrueling Microscope