Oura Kenjiro | Faculty Of Engineering Osaka University

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著作論文

Methodology for Accurate Oxygen Distribution Analysis and Its Application to YBa_2Cu_3O_x Thin Films Using ^O(α, α)^O 3.045 MeV Resonance Reaction
Ion Beam Analysis of the Concentration and Thermal Release of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD Method : Surfaces, Interfaces and Films
A Novel Method of Sputter Deposition Utilizing a Hot-Cathode Penning Ion Source
Ion Channeling Study of Epitaxially Grown HoBa_2Cu_3O_x Thin Films on MgO(001)
Elastic Recoil Detection Analysis of the Concentration and Thermal Release of Hydrogen in a-Si:H Films by the ECR Plasma CVD Method
Cylindrical Mirror Analyzer (CMA) with an Axially Integrated ISS-AES Gun for Surface Composition Analysis : Techniques, Instrumentations and Measurement
Oxygen-Enhanced Surface Segregation of Mn in Cu-Mn and Ag-Mn Alloy Films Studied by ISS/AES : Surfaces, Interfaces and Films
Detection of Hydrogen on Solid Surfaces by Low-Energy Recoil Ion Spectroscopy
New Surface Structure of Pd on Si(111) Studied by Low-Energy Ion-Scattering Spectroscopy and LEED-AES
Atomic Arrangement of the Si(111)-√×√-Ag Structure Derived from Low-Energy Ion-Scattering Spectroscopy

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