Shoji F | Electron Engineering Faculty Of Engineering Osaka University
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概要
関連著者
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Oura K
Research Center For Ultrahigh Voltage Electron Microscopy Osaka University
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Shoji F
Electron Engineering Faculty Of Engineering Osaka University
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WATAMORI Michio
Department of Electronic Engineering, Faculty of Engineering, Osaka University
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Shoji Fumiya
Department Of Applied Physics Faculty Of Engineering Kobe University
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Oura Kenjiro
Department Of Elecronic Engineering Graduate School Of Engineering Osaka University
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Watamori Michio
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Shoji Fumiya
Faculty Of Engineering Osaka University
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OURA Kenjiro
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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Terashima Takahito
Institute for Chemical Research, Kyoto University
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Bando Yoshichika
Institute For Chemical Reaearch Kyoto University
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Ohnishi Hiroaki
Fujitsu Laboratories Ltd.
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Ohnishi H
Taihei Kogyo Co. Ltd. Himeji Jpn
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Shoji Fumiya
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Shoji Fumiya
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Oura Kenjiro
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Ohnishi Hiroaki
Division Of Hematology Faculty Of Medicine Kagawa University
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Ohnishi Hideaki
Department Of Materials Science Faculty Of Engineering Toin University Of Yokohama
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KATAYAMA Itsuo
Department of Applied Physics, Faculty of General Education, Osaka Institute of Technology
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OHBA Yasuyuki
Department of Applied Physics, Faculty of General Education, Osaka Institute of Technology
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Ohba Yasuyuki
Department Of Inorganic Materials Faculty Of Engineering Tokyo Institute Of Technology
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Katayama I
Department Of Applied Physics Faculty Of General Education Osaka Institute Of Technology
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WATAMORI Michio
Low Temperature Center, Osaka University
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Oura Kenjiro
Faculty Of Engineering Osaka University
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Terashima Takahito
Institute For Chemical Research Kyoto University
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Terashima Takahito
Institute For Chemical Reaearch Kyoto University
著作論文
- Methodology for Accurate Oxygen Distribution Analysis and Its Application to YBa_2Cu_3O_x Thin Films Using ^O(α, α)^O 3.045 MeV Resonance Reaction
- Growth Processes of Si(111)-√×√-Ag Studied by Scanning Tunrueling Microscope
- Ion Channeling Study of SrTiO_3 Substrates and As-Deposited YBa_2Cu_3O_x Thin Films