High-Energy Ion Beam Analysis of YBa2Cu3Ox Thin Films
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概要
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The composition and crystalline structure of high-$T_{\text{c}}$ superconducting YBa2Cu3Ox thin films formed on MgO(100) and Si(100) substrates have been investigated by Rutherford backscattering and channeling techniques. Y, Ba, Cu contents have been analyzed by employing a high-energy (over 4.5 MeV) 4He ions and large scattering angle (near 170°) condition, where Y, Ba and Cu peaks are clearly separated from each other. Oxygen concentration has been obtained through the use of low primary energy (below 2.5 MeV) and small scattering angle (below 150°) conditions, where the O peak is separated from the background. The crystalline quality of the films has also been investigated by ion channeling techniques.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1989-03-20
著者
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YOTSUYA Tsutomu
Osaka Science and Technology Center
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OGAWA Soichi
Osaka Prefectural Industrial Technology Research Institute
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Shoji Fumiya
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Hanawa Teruo
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Oura Kenjiro
Electron Beam Laboratory Faculty Of Engineering Osaka University
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Watamori Michio
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Suita, Osaka 565
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Shoji Fumiya
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Suita, Osaka 565
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Hanawa Teruo
Electron Beam Laboratory, Faculty of Engineering, Osaka University, Suita, Osaka 565
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Yotsuya Tsutomu
Osaka Prefectural Industrial Research Institute, Enokojima, Nishiku, Osaka 550
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