Effects of Ion Species on Reactive-Ion-Beam-Sputtered Zr-N Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-01-15
著者
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Nagasaka Takeshi
Technology Research Institute Of Osaka Prefecture
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Yoshitake Masaaki
Osaka Prefectural Industrial Technology Research Institute
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OGAWA Soichi
Osaka Prefectural Industrial Technology Research Institute
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Okamoto Akio
Osaka Prefectural Industrial Technology Research Institute
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NOSAKA Toshikazu
Osaka Prefectural Industrial Technology Research Institute
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- Effects of Nitrogen Pressure and RF Power on the Properties of Reactive Magnetron Sputtered Zr-N Films and an Application to a Thermistor
- Fabrication of Bi(Pb)SrCaCuO Thin Film of High-T_c Phase
- Effects of Ion Species on Reactive-Ion-Beam-Sputtered Zr-N Films
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