Sato Y | Department Of Metallurgy Graduate School Of Engineering Tohoku University
スポンサーリンク
概要
関連著者
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Sato Yuzuru
Seiko Epson Corp. Research And Development Div.
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Sato Y
Department Of Metallurgy Graduate School Of Engineering Tohoku University
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Sato Y
Ntt Microsystem Integration Laboratories
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Sato Y
Nagaoka Univ. Technol. Nagaoka Jpn
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Sato Yasuhiko
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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TAKEZOE Hideo
Tokyo Institute of Technology, Department of Organic and Polymeric Materials
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FUKUDA Atsuo
Tokyo Institute of Technology, Department of Organic and Polymeric Materials
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Takezoe Hideo
Tokyo Institute Of Technology Department Of Organic And Polymeric Materials
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Fukuda Asuo
Department Of Kansei Engineering Faculty Of Textile Science And Technology Shinshu University
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ANDOH Hisashi
Hitachi Research Laboratory, Hitachi, Ltd.
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SATO Yoshio
Hitachi Research Laboratory, Hitachi, Ltd.
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Andoh H
Hitachi Research Laboratory Hitachi Ltd.
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Andoh Hisashi
Hitachi Research Laboratory Hitachi Ltd.
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Fukuda Atsuo
Tokyo Institute Of Technology Department Of Bioengineering
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Kondo Katsumi
Tokyo Institute Of Technology Department Of Textile And Polymeric Materials
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Kondo K
Hitachi Ltd. Ibaraki
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KUZE Eiichi
Tokyo Institute of Technology, Department of Textile and Polymeric Materials
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SATO Yuzuru
Tokyo Institute of Technology, Department of Textile and Polymeric Materials
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IKUTA Isao
Hitachi Research Laboratory, Hitachi, Ltd.
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Ikuta Isao
Hitachi Research Laboratory Hitachi Ltd.
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Kuze Eiichi
Tokyo Institute Of Technology Department Of Textile And Polymeric Materials
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Kondo Katsumi
Tokyo Institute Of Technology Department Of Organic And Polymeric Materials
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Sato Yuichi
Department of Imaging, Health Park Clinic Kurosawa
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SATO Susumu
Department of Electrical and Electronic Engineering, Akita University
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土屋 敏章
島根大学 総合理工学部
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森田 隆二
北海道大学大学院工学研究科応用物理学専攻
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SATO Yasuhiro
Department of Applied Physics, Hokkaido University
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MORITA Ryuji
Department of Applied Physics, Hokkaido University
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YAMASHITA Mikio
Department of Applied Physics, Hokkaido University
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YOSHIDA Kunio
Department of Mechanical Sciences and Engineering, Tokyo Institute of Technology
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YOSHIDA Hidetsugu
Institute of Laser Engineering, Osaka University
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Sato Yoko
Department of Cardiology, Graduate School of Comprehensive Human Sciences, University of Tsukuba
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Tamura Shigeharu
Government Industrial Research Institute
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KIMURA Saburo
Government Industrial Research Institute
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SATO Yoshiyuki
Government Industrial Research Institute
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YOSHIDA Kunio
Osaka Institute of Technology
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Miyasato Keita
Nagasaki University Faculty Of Liberal Arts
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Yoshida Kunio
Department Of Electronics Information And Communication Engineering Osaka Institute Of Technology
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Sato Yuichi
Department Of Imaging Health Park Clinic Kurosawa
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IWAMOTO Mitsumasa
Department of Physical Electronics, Tokyo Institute of Technology
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FLATISCHLER Kurt
Tokyo Institute of Technology, Department of Textile and Polymeric Materials
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SKARP Kent
Tokyo Institute of Technology, Department of Textile and Polymeric Materials
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MIYASATO Keita
Tokyo Institute of Technology, Department of Textile and Polymeric Materials
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Abe Tomoki
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Takahashi Nobuyuki
Department of Internal Medicine, Kansai Medical University Kouri Hospital
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Tsuchiya T
Department Of Electronics Doshisha University
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Yoshida Hidemi
Thin Films Laboratory Research Center Mitsubishi Kasei Corporation
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森田 隆二
北大 大学院工学研究科
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Skarp Kent
Chalmers University Of Technology Physics Department
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Arai E
Department Of Engineering Physics Electronics And Mechanics Nagoya Institute Of Technology
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Arai E
Nagoya Inst. Technol. Nagoya Jpn
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Arai E
Japan Oil Gas And Metals National Corp. Kawasaki‐shi Jpn
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MAEDA Yoshihito
Hitachi Research Laboratory, Hitachi Ltd.
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Kimura Shingo
Department Of Physics School Of General Education Iwate Medical University
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山村 力
東北大
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山村 力
東北大・工学部
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Matsumoto S
Faculty Of Science And Technology Keio University
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Matsumoto Satoru
Department Of Electronics And Electrical Engineering Keio University
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SHIMIZU Takashi
Faculty of Science and Technology, Keio University
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TAKAGI Toshio
Faculty of Science and Technology, Keio University
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MATSUMOTO Satoru
Faculty of Science and Technology, Keio University
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SATO Yoshiyuki
NTT LSI Laboratories
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ARAI Eisuke
Nagoya Institute of Technology
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ABE Takao
SEH R&D Center, Shin-Etsu Handotai Co., Ltd.
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Takagi Toshio
Faculty Of Science And Technology Keio University
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Abe T
Seh Isobe R&d Center Shin-etsu Handotai Co. Ltd.
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Abe Takao
Shin-etsu Handotai
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Abe Takao
Shin-etsu Handotai Company
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Abe Takao
Seh R&d Center Shin-etsu Handotai Co. Ltd.
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Maeda Y
Deparment Of Information And Control Engineering Toyota Technological Institute
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ONISHI Yasunobu
Process and Manufacturing Engineering Center, Toshiba Corporation
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MAJIMA Yutaka
Department of Physical Electronics, Graduate School of science and Engineering, Tokyo Institute of T
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WU Chen-Xu
Department of Physical Electronics, Tokyo Institute of Technology
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Shimizu T
Univ. Occupational And Environmental Health Jpn
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Yoshida K
Osaka Institute Of Technology
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Wu C‐x
Tokyo Inst. Technol. Tokyo Jpn
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Wu Chen-xu
Department Of Physical Electronics Tokyo Institute Of Technology
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Sato Yuzuru
Department Of Metallurgy Graduate School Of Engineering Tohoku University
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Kimura S
Ntt Photonics Lab. Kanagawa Jpn
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YAMAMURA Tsutomu
Department of Metallurgy, Graduate School of Engineering, Tohoku University
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ZHU Hongmin
Department of Metallurgy, Graduate School of Engineering, Tohoku University
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Nakano Yoshiaki
Research Center For Advanced Science And Technology Univ. Of Tokyo
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Nakano Yoshiaki
Graduate School Of Engineering The University Of Tokyo
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Yamashita Mikio
Department Of Applied Physics Hokkaido University
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Kosugi Toshihiko
Department Of Electric Engineering Faculty Of Engineering Science Osaka University
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Shimizu Tadao
Department Of Physics University Of Tokyo
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Onishi Yasunobu
Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Onishi Yasunobu
Microelectronics Engineering Laboratories Toshiba Corporation
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Onishi Yasunobu
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Sato Yasuhiko
Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Shimizu T
Department Of Electrical And Electronic Engineering Kanazawa University
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Minemura H
Hitachi Ltd. Tokyo Jpn
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Maeda Y
Center For Microelectronic Systems Kyushu Institute Of Technology
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Maeda Y
Sony Corp. Tokyo Jpn
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MINEMURA Hiroyuki
Hitachi Research Laboratory, Hitachi,Ltd.
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Shimizu T
Faculty Of Engineering Chiba University
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Kimura S
Central Research Laboratory Hitachi Ltd.
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SATO Yasuhiro
NTT System Electronics Laboratories
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KOSUGI Toshihiko
NTT Wireless System Laboratories
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TSUCHIYA Toshiaki
Department of Electronic and Control Systems Engineering
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ISHII Hiromu
NTT System Electronics Laboratories
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Tamura S
Sony Corp. Yokohama Jpn
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Abe T
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Nakano Y
Research Center For Advanced Science And Technology The University Of Tokyo
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Morita Ryuji
Department Of Applied Physics Faculty Of Engineering University Of Tokyo
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Ishii H
Sci. Univ. Tokyo Chiba‐ken Jpn
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Takagi T
Faculty Of Science And Technology Keio University
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Maeda Yoshihito
Hitachi Research Laboratory Hitachi Ltd.
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Matsumoto S
Ntt Telecommunications Energy Laboratories
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真島 豊
東京工大
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Majima Yutaka
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Konishi Yusuke
Division Of Electric Electronic And Information Engineering Graduate School Of Engineering Osaka Uni
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Sato Susumu
Department Of Electrical And Electronic Engineering Akita University
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Konishi Yusuke
Department Of Mechanical Sciences And Engineering Tokyo Institute Of Technology
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Shimizu T
Chiba Univ. Chiba Jpn
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Sato Yoko
Department Of Bioscience And Biotechnology Faculty Of Agriculture Tottori University
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Iwamoto Mitsumasa
Department Of Electrical And Electronic Engineering
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Yoshida Hidetsugu
Institute Of Laser Engineering Osaka University
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Zhu Hongmin
Department Of Metallurgy Graduate School Of Engineering Tohoku University
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Hayase S
Graduate School Of Life Science And Systems Engineering Kyushu Institute Of Technology
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Takahashi N
Department Of Electrical And Electronic Engineering Mining College Akita University
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Takahashi Nobuyuki
Department Of Applied Physics Faculty Of Engineering Hokkaido University
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Flatischler Kurt
Tokyo Institute Of Technology Department Of Textile And Polymeric Materials:chalmers University Of T
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Yamamura Tsutomu
Department Of Metallurgy Graduate School Of Engineering Tohoku University
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HAYASE Shuji
Graduate School of Life Science and System Engineering, Kyushu Institute of Technology
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吉田 起國
京大原子エネルギー研
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Masaki T
Japan Aerospace Exploration Agency
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Tsuboi Nozomu
Faculty Of Engineering Niigata University
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Tsuboi Nozomu
Department Of Electrical Engineering Nagaoka University Of Technology:(present Address)department Of
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MOTOKOSHI Shinji
Institute of Laser Engineering, Osaka University
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YOSHIDA Kunio
Institute of Laser Engineering, Osaka University
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Shiobara E
Toshiba Corp. Semiconductor Co. Kanagawa Jpn
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Shiobara Eishi
Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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OUCHI Yukio
Tokyo Institute of Technology, Department of Organic and Polymeric Materials
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MASAKI Tadahiko
National Space Development Agency of Japan
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YODA Shinichi
National Space Development Agency of Japan
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Yoshida Kunio
Institute Of Laser Engineering Osaka University
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Yoda Shinichi
Institute Of Space And Astronautical Science Japan Aerospace Exploration Agency
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Matsui Tetsuro
Department Of Metallurgy Graduate School Of Engineering Tohoku University
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YAMASAKI Michiaki
Department of Materials Science, Kumamoto University
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Endo Mamoru
Department Of Physical Electronics Faculty Of Engineering Tokyo Institute Of Technology:(present Add
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Endo Mamoru
Department Of Internal Medicine Shiga University Of Medical Science
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Endo Mamoru
Department Of Metallurgy Graduate School Of Engineering Tohoku University
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Matsuyama H
Process And Manufacturing Engineering Center Toshiba Corporation
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YAMADA Satoru
Research Center for Heavy Ion Medicine, Gunma University
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MATSUYAMA Hideto
Process and Manufacturing Engineering Center, Toshiba Corporation
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NAKANO Yoshihiko
Research and Development Center, Toshiba Corporation
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Yoda S
Institute Of Space And Astronautical Science Japan Aerospace Exploration Agency
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Aoki K
Tohoku Univ. Sendai Jpn
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Sugita Tatsuya
Hitachi Research Laboratory Hitachi Ltd.
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OOIDA Toshihiko
National Space Development Agency of Japan
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Yoshida Kunio
Osaka Inst. Of Technolog Osaka Jpn
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ABE Junko
Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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YOSHIKAWA Sawako
Corporate Research & Development Center, Toshiba Corporation
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NAKANO Yoshihiko
Corporate Research & Development Center, Toshiba Corporation
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HAYASE Shuji
Corporate Research & Development Center, Toshiba Corporation
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Hiyama Tamejiro
Department Of Material Chemistry Kyoto University
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Hagiwara Takashi
Tokyo Institute Of Technology Department Of Organic And Polymeric Materials
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Takeshita Hiroshi
Seiko Epson Corp. Research And Development Div.
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Matsuyama Hideto
Process And Manufacturing Engineering Center Toshiba Corporation
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KUGIYA Fumio
Central Research Laboratory, Hitachi Ltd.
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KADO Yuichi
NTT System Electronics Laboratories
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NARUSE Atsuko
Hitachi Research Laboratory, Hitachi, Ltd.
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IWABUCHI Katsuyuki
Department of Metallurgy, Tohoku University
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TSUBOI Nobuyoshi
Hitachi Research Laboratory, Hitachi, Ltd.
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FUSHIMI Tetsuya
Hitachi Research Laboratory, Hitachi, Ltd.
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YASUKAWA Saburoh
Hitachi Research Laboratory, Hitachi, Ltd.
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MUTO Nobuyoshi
Hitachi Research Laboratory, Hitachi, Ltd.
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TUNODA Yoshito
Hitachi Research Laboratory, Hitachi, Ltd.
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Sato Y
Center For New Materials Japan Advanced Institute Of Science And Technology
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Sato Yuuki
Center For New Material Japan Advanced Institute Of Science And Technology
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Kado Yuichi
Ntt Microsystem Integration Laboratories
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Kado Yuichi
Ntt Microsystem Integration Laboratories Ntt Corporation
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Ouchi Yukio
Tokyo Institute Of Technology Department Of Organic And Polymeric Materials
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Kugiya Fumio
Central Research Laboratory Hitachi Ltd.
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Morita T
Mitsubishi Electric Corporation
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Tsuboi N
Faculty Of Engineering Niigata University
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Muto Nobuyoshi
Hitachi Research Laboratory Hitachi Ltd.
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Tsunoda Y
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Yamada Syoji
Center For New Materials Japan Advanced Institute Of Science And Technology
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Takahashi N
Toyohashi Univ. Technol. Toyohashi Jpn
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Fushimi Tetsuya
Hitachi Research Laboratory Hitachi Ltd.
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Yoda Shinichi
National Space Davelopment Agency Of Japan
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Hagiwara T
Central Research And Development Laboratory Showa Shell Sekiyu K.k.
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Takata Masaki
Materials Science Division Japan Synchrotron Radiation Research Institute (spring-8/jasri) Crest-jst
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Naruse Atsuko
Hitachi Research Laboratory Hitachi Ltd.
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TANAKA Taka-aki
Seiko Epson Corp., Research and Development Div.
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KOBAYASHI Hidekazu
Seiko Epson Corp., Research and Development Div.
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AOKI Kazuo
Seiko Epson Corp., Research and Development Div.
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WATANABE Hiroshi
Seiko Epson Corp., Research and Development Div.
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Yasuhiro S
Japan Aerospace Exploration Agency
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Yoda Shinichi
Space Utilization Research Center National Space Development Agency Of Japan
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Motokoshi S
Inst. Laser Technol. Osaka Jpn
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Motokoshi Shinji
Institute For Laser Technology
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Shiobara Eishi
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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GOZU Shin-ichiro
CRESTJapan Science and Technology
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KITA Tomohiro
Center for New Materials, Japan Advanced Institute of Science and Technology
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Yasukawa Saburoh
Hitachi Research Laboratory Hitachi Ltd.
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Nakano Yoshihiko
Research And Development Center Toshiba Corporation
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Yamasaki Michiaki
Department Of Materials Science And Engineering Graduate School Of Science And Technology Kumamoto U
著作論文
- Femtosecond Optical Pulse Compressor Using CS_2 Liquid-Core Fiber with Negative Delayed Nonlinear Response
- Study on Ultrafast Dynamic Behaviors of Different Nonlinear Refractive Index Components in CS_2 Using a Femtosecond Interferometer
- Substrate Dependence of Laser-Induced Damage Threshold of Scandium Oxide High-Reflector Coatings for UV Pulsed Laser
- Influence of Deposition Parameters on Laser Damage Threshold of 355-nm Scandium Oxide-Magnesium Fluoride High-Reflector Coatings
- Helical Pitches and Tilt Angles in Room Temperature Ferroelectric Chiral Smectic C Liquid Crystals, MORA n and MBRA n
- Magnetic Field Effects on Preparing Thin Homogeneous Ferroelectric Smectic Cells for Electro-Optical Microsecond Switches
- Anomalous Electric Field Dependence of Helical Pitches in Ferroelectric Sm C : at Temperatures Close to the Phase Transition to Sm A
- Fraction of Interstitialcy Component of Phosphorus and Antimony Diffusion in Silicon
- Fraction of Interstitialcy Component of Phosphorus and Antimony Diffusion in Silicon
- Optimization of Polysilane Structure as Fast-Etching Bottom Antireflective Coating for Deep Ultraviolet Lithography
- Determination of Dielectric Relaxation Time of Langmuir-Films by a Whole-Curve Method Using the Maxwell Displacement Current
- Determination of the Piezoelectric Coefficient of Monolayers on Water Surface by Maxwell-Displacement-Current Measurement
- Measurements of Impurity Diffusion Coefficients in Ionic Melts with High Accuracy under Microgravity (特集 MSL-1(3))
- Application of Organic Silicon Clusters to Pattern Transfer Process for Deep UV Lithography
- Single-Beam Overwrite with a New Erase Mode of In_3 SbTe_2 Phase-Change Optical Disks : Media
- Single-Beam Overwrite with a New Erase Mode of In_3SbTe_2 Phase-Change Optical Disks
- Improving the Characteristics of Ultra-Thin-Film Fully-Depleted Metal-Oxide-Semiconductor Field Effect Transistors on SIMOX (Separation by IMplanted OXygen) by Selective Tungsten Deposition on Source and Drain Region
- 300-kilo-Gate Sea-of-Gate Type Gate Arrays Fabricated Using 0.25-μm-Gate Ultra-Thin-Film Fully-Depleted Complementary Metal-Oxide-Semiconductor Separation by IMplanted OXygen (CMOS/SIMOX) Technology with Tungsten-Covered Source and Drain
- Properties of Full-Color Fluorescent Display Devices Excited by a UV Light-Emitting Diode
- Full-Color Fluorescent Display Devices Using a Near-UV Light-Emitting Diode
- Crystallizing Mechanism and Recording Properties of In_3SbTe_2 Phase-Change Optical Disks
- Brillouin Spectra and Structural Relaxation in ZnCl_2-KCl Binary Melts
- 2.5 Inch Flat-Type Phase-Change Optical Disk Drive
- High Quality Ferroelectric Liquid Crystal Display with Quasi-Bookshelf Layer Structure
- Ballistic Spin Transport in Four-Terminal NiFe/In_Ga_As Structure : Semiconductors