Ogawa Hisashi | Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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概要
- OGAWA Hisashiの詳細を見る
- 同名の論文著者
- Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co. の論文著者
関連著者
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Mori Yoshihiro
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Okuno Yasutoshi
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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OKUNO Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.
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奥野 泰利
日本テキサスインスツルメンツ(株)、ulsi技術開発センター
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Tsuzumitani Akihiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Ogawa Hisashi
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Okuno Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp., 19, Nishikujo-kasuga cho, Minami-ku, Kyoto 601-8413, Japan
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Mori Y
Research Center For Ultra-precision Science And Technology Graduate School Of Engineering Osaka Univ
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Mori Yusuke
Graduate School of Engineering, Osaka University
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Mori Yoshihiro
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.
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TSUZUMITANI Akihiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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OHNO Yoshikazu
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
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YONEDA Masahiro
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
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OGAWA Hisashi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.
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DORNFEST Charles
Applied Materials
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JIN Xiaoliang
Applied Materials
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KHER Shreyas
Applied Materials
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TAO Jerry
Applied Materials
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WANG Yaxin
Applied Materials
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ZHAO Jun
Applied Materials
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Yutani Akie
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Mori Y
Osaka Univ. Suita Jpn
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Okudaira Tomonori
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Shinkawata Hiroki
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Mazumder Motaharul
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Kashihara Keiichiro
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Tsunemine Yoshikazu
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Okuno Y
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Ogawa Hisashi
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.
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奥野 泰利
松下電器産業(株)
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Tsuzumitani Akihiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Mori Yuzo
Department Of Mechanical Engineering Kochi National College Of Technology
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Okudaira Tomonori
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technology Corp., 4-1, Mizuhara, Itami, Hyogo 664-0005, Japan
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Tsunemine Yoshikazu
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technology Corp., 4-1, Mizuhara, Itami, Hyogo 664-0005, Japan
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Mazumder Motaharul
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technology Corp., 4-1, Mizuhara, Itami, Hyogo 664-0005, Japan
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Shinkawata Hiroki
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technology Corp., 4-1, Mizuhara, Itami, Hyogo 664-0005, Japan
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Tsuzumitani Akihiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp., 19, Nishikujo-kasuga cho, Minami-ku, Kyoto 601-8413, Japan
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Ogawa Hisashi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp., 19, Nishikujo-kasuga cho, Minami-ku, Kyoto 601-8413, Japan
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Ohno Yoshikazu
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technology Corp., 4-1, Mizuhara, Itami, Hyogo 664-0005, Japan
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Yoneda Masahiro
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technology Corp., 4-1, Mizuhara, Itami, Hyogo 664-0005, Japan
著作論文
- Low Temperature BST-CVD Process for the Concave-Type Capacitors Designed for Logic-Base-Embedded DRAMs
- Pt/BaxSr(1-x)TiO3/Pt Capacitor Technology for 0.15 μm Embedded Dynamic Random Access Memory