Effect of RF-Biased Electrode on Microwave Plasma
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-06-15
著者
-
OHTSU Yasunori
Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Sag
-
FUJITA Hiroharu
Department of Electrical and Electronic Engineering, Saga University
-
OKUNO Yoshihiro
Department of Energy Sciences, Tokyo Institute of Technology
-
Okuno Y
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
関連論文
- High-Density Radio-Frequency Plasma Sources Produced by Capacitive Discharge with Various Methods for Thin-Film Preparation
- Pt/Ba_xSr_TiO_3/Pt Capacitor Technology for 0.15μm Embedded Dynamic Random Access Memory
- Low Temperature BST-CVD Process for the Concave-Type Capacitors Designed for Logic-Base-Embedded DRAMs
- Extendibility of Ta_2O_5 Metal-Insulator-Metal Capacitor Using Ru Electrode
- Ru-Ta_2O_5MIM Capacitor toward 0.1μm DRAM Cell
- Spatial Behavior of the Plasma Potential in a Magnetized Radio-Frequency Discharge from Emissive Probe Data(Gases, plasmas, electric discharges, and beams)
- Improvement of Plasma-flow Behavior and Performance of a Disk MHD Generator under High Magnetic Flux Densities
- Characteristics of Microwave Plasma and Preparation of a-Si Thin Film
- Influence of Substrate Biasing on (Ba, Sr)TiO_3 Films Prepared by Electron Cyclotron Resonance Plasma Sputtering
- Energy Distribution of Ions Incident onto a Dc-Biased Substrate in Electron Cyclotron Resonance Sputtering Plasma for SrTiO_3 Thin Film Preparation
- Measurement of Ion Temperature in Electron Cyclotron Resonance Plasma
- In Situ X-Ray Monitoring of Metalorganic Vapor Phase Epitaxy
- Effect of RF-Biased Electrode on Microwave Plasma
- Improved Growth Kinetic Model for Metalorganic Molecular Beam Epitaxy Using Triethylgallium
- Selective Area Epitaxy of GaSb by Metal-Organic Molecular Beam Epitaxy
- Threading Dislocation Reduction in InP on GaAs by Thin Strained Interlayer and its Application to the Fabrication of 1.3-μm-Wavelength Laser on GaAs
- Measurement of Electron Energy Distribution Function in a Low-Pressure rf Discharge Plasma
- Modulation of Electron Velocity Distribution Function by Moving Cathode Sheath in a Low-Pressure rf Discharge
- Improved Self-Aligned Structure for GaAlAs High-Power Lasers
- CF_3, CF_2 and CF Radical Measurements in RF CHF_3 Etching Plasma Using Infrared Diode Laser Absorption Spectroscopy ( Plasma Processing)
- Performance of Large Scale Non-equilibrium Plasma MHD Generator Coupled with Radio-Frequency Electromagnetic Field
- Direct Wafer Bonding Technique Aiming for Free-Material and Free-Orientation Integration of Semiconductor Materials
- Influence of the Relaxation Current in Ba_xSr_lt(1-x)gtTiO_3 Thin Film Capacitors on DRAM Operation
- Ar/O_2 gas pressure dependence of atomic components of zirconia prepared by intermittent zirconium arc PBII&D
- Characteristics of Hole Plasma in the Presence of Ion Beam Injection
- Temporal Behavior of Charged Particles in a Radio Frequency Afterglow Plasma Containing Negative Ions
- Ion Collection by a Hollow Probe in ECR Microwave Plasma under a Divergent Magnetic Field
- High-density radio-frequency plasma sources produced by capacitive discharge with various methods for thin-film preparation (特集 日本のプラズマ研究最前線)
- Inductively Coupled Plasma by means of a Novel External Antenna
- Dust Particles Levitation near a Powered Electrode in a Capacitively Coupled RF Plasma
- Influence of Xe Gas Concentration on Plasma Parameters and Luminance Characteristics in Fluorescent Lamps driven by an Inductively Coupled Radio Frequency Discharge Using Ne / Xe Mixture Gases
- Development of Compact Ozonizer by Barrier Discharge for High Concentration Ozone Generation
- Energy Distribution Functions of Ions Impacted on a Negatively Biased Substrate in an Electron Cyclotron Resonance Microwave Plasma
- セルキャパシター誘電体としてのBa_xSr_TiO_3が有する21世紀のDRAMに対する影響 : DRAMセルキャパシター構造の簡略化を指向した高誘電体薄膜の開発
- Potential Structure of Positively Biased Oscillating Substrate in a Low Pressure Plasma
- 混載DRAM用低温BST-CVDキャパシタ開発
- MOMBE法によるAIGaSbの成長