High-density radio-frequency plasma sources produced by capacitive discharge with various methods for thin-film preparation (特集 日本のプラズマ研究最前線)
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概要
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Radio-frequency plasma produced by capacitive discharge has been widely used for microelectronic industry because it has a simple structure in its device and its easy maintenance. However, it has disadvantage such as a low plasma-density with the magnitude of 108-109 cm-3. In the paper, high-density radio-frequency capacitive-discharge plasma sources with various methods have been reviewed for thin-film preparation. These methods are the segmented electrode under high driving frequency, the high-secondary-electron-emission-electrode and the various hollow cathode electrodes. In this review, these solutions are assessed and discussed.
- 社団法人 電気学会の論文
著者
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OHTSU Yasunori
Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Sag
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Ohtsu Yasunori
Department Of Electrical & Electronic Engineering Saga University
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