Potential Oscillations in an Electronegative Plasma Driven by an Asymmetry RF Discharge
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概要
- 論文の詳細を見る
Potential oscillations of electronegative plasmas have been experimentally studied in a strongly asymmetric rf (13.56 MHz) discharge. Oscillation amplitudes in the plasma were found to increase suddenly from 10 to 60 V with increasing concentration of SF6 gas in He gas, while gradually from 10 to 40 V in CF4 mixed plasma. The electron energy distribution functions (EEDFs) measurement predicted an electron beam travelling from the plasma towards the rf electrode because of the potential double layer in the sheath picked up by an emissive probe. A clear difference in potential formation and EEDFs profiles in comparison to those in electropositive plasmas has been detected. A more marked gas concentration dependence was obtained in a SF6 gas than in a CF4 one due to the more active production of negative ions in a SF6 plasma.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-07-30
著者
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Ohtsu Yasunori
Department Of Electrical & Electronic Engineering Saga University
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NASSER Mahmood
Department of Electrical and Electronic Engineering Saga University
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Tochitani Gen
Department Of Electrical Engineering Saga University
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Fujita Hiroharu
Department Of Electrical & Electronic Engineering Saga University
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Fujita Hiroharu
Department of Electrical Engineering, Saga University, Honjo-machi 1, Saga 840, Japan
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Tochitani Gen
Department of Electrical and Electronic Engineering, Saga University,
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Tochitani Gen
Department of Electrical Engineering, Saga University, Honjo-machi 1, Saga 840, Japan
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