An Influence of a Heating Voltage on an Emissive Probe Characteristic in a Plasma
スポンサーリンク
概要
- 論文の詳細を見る
An infiuence of a heating voltage on potential measurements by an emissive probe imnlersed in a plasma is studied. It is found that a peak point of the first-derivative curve of the current-voltage characteristic shifts even during the off cycle of the heating voltage with a half-wave rectified sinusoidal form. Calculations predict that this comes from a joule heating effect.
- 社団法人日本物理学会の論文
- 1981-11-15
著者
-
山田 栄一
佐賀大理工
-
Yagura Shinya
Department Of Electricol Engineering Saga University
-
Yagura Shinya
Department Of Electrical Engineering Saga University
-
Yamada Eiichi
Department Of Electricol Engineering Saga University
-
Yamada Eiichi
Department Of Electrical Engineering Faculty Of Science And Engineering Saga University
-
Fujita Hiroharu
Department Of Electricol Engineering Saga University
-
Fujita Hiroharu
Department Of Electrical And Electronic Engineering Saga University
-
Fujita Hiroharu
Department Of Electrical & Electronic Engineering Saga University
-
Yamada Eiichi
Department of Chemistry, Tokyo Metropolitan University
関連論文
- 1p-Z-5 電流駆動型イオン音波不安定性中の電位分布
- Spatial Behavior of the Plasma Potential in a Magnetized Radio-Frequency Discharge from Emissive Probe Data(Gases, plasmas, electric discharges, and beams)
- Characteristics of Microwave Plasma and Preparation of a-Si Thin Film
- Influence of Substrate Biasing on (Ba, Sr)TiO_3 Films Prepared by Electron Cyclotron Resonance Plasma Sputtering
- 1p-Z-7 Shock waveによる過渡的ダブルレイヤーの形成
- 2a-NXE-2 ダブルレイヤーにおけるイオンの役割
- 電子放出グリッドとプローブによるイオン音波の励起と検出
- 31a KB-11 電流駆動型不安定性によるイオン波乱流スペクトラム
- 31a KB-10 イオンビームプラズマ系におけるコヒーレンス波の観測
- イオンビームプラズマ系における2流体不安定性の観測
- 閉管法によるZnTeの気相成長 : 気相成長
- Measurement of Electron Energy Distribution Function in a Low-Pressure rf Discharge Plasma
- Ar/O_2 gas pressure dependence of atomic components of zirconia prepared by intermittent zirconium arc PBII&D
- Characteristics of Hole Plasma in the Presence of Ion Beam Injection
- Temporal Behavior of Charged Particles in a Radio Frequency Afterglow Plasma Containing Negative Ions
- Ion Collection by a Hollow Probe in ECR Microwave Plasma under a Divergent Magnetic Field
- Inductively Coupled Plasma by means of a Novel External Antenna
- Dust Particles Levitation near a Powered Electrode in a Capacitively Coupled RF Plasma
- Influence of Xe Gas Concentration on Plasma Parameters and Luminance Characteristics in Fluorescent Lamps driven by an Inductively Coupled Radio Frequency Discharge Using Ne / Xe Mixture Gases
- Development of Compact Ozonizer by Barrier Discharge for High Concentration Ozone Generation
- Energy Distribution Functions of Ions Impacted on a Negatively Biased Substrate in an Electron Cyclotron Resonance Microwave Plasma
- Potential Structure of Positively Biased Oscillating Substrate in a Low Pressure Plasma
- Sheath structure of the oscillating substrate in a collisionless plasma
- Vapor Growth of Zinc Telluride by Closed Tube Method
- V-Shaped Potential Distribution with a Virtual Cathode Generated by an Electron Beam Injection
- An Influence of a Heating Voltage on an Emissive Probe Characteristic in a Plasma
- Reduction of Electron Temperature in rf Plasma Using Magnetic Filter
- Measurements of Ion Temperature by Langmir Probes in a Non-Magnetized Plasma
- Measurements of Fast Time Evolutions of Plasma Potential Using Emissive Probe
- Influence of Electron-Beam Injection on Pre-Discharge State in a Low Pressure Gas
- Downstream Ion Energy Control in Negative Ion Plasma Produced by a Helical Antenna
- Downstream Control of Negative-Ion Plasma Parameters in Helicon Discharge
- Negative Ion Plasma Production Using Immersed Type Antenna in a Magnetic Field
- Propagation of Free-Streaming Ions and Ion Bursts Excited by a Grid in a Plasma
- RF Potential Formation in Electronegative Plasma Columu under a Magnetic Field
- An Analysis of Spherical Langmuir Probe Characteristics in a Collisionless Plasma
- Ultra-Water Repellency of Films Prepared by Capacitively Coupled C2H2F2/Ar Discharge Plasma
- Observation of an Inductively Coupled RF Discharge with One-Turn Internal Antenna
- Annular Profile of Dust Density near RF-Powered Electrode in a Capacitively Coupled Plasma
- Mode conversion of RF discharge in plasma driven by helical or spiral type antennas
- Measurements of Ion Energy Distribution Functions in an Radio Frequency Plasma Excited with an m = 0 Mode Helical Antenna and Thin Film Preparation
- Potential Oscillations in an Electronegative Plasma Driven by an Asymmetry RF Discharge
- Influences of Gap Distance on Plasma Characteristics in Narrow Gap Capacitively Coupled Radio-Frequency Discharge
- Time-Averaged Energy Distribution Function of Ions Impacted on an RF-biased Substrate in Electron Cyclotron Resonance Microwave Plasma
- Energy Distribution of Ions Incident onto a Dc-Biased Substrate in Electron Cyclotron Resonance Sputtering Plasma for SrTiO3 Thin Film Preparation
- High Ozone Generation with a High-Dielectric-Constant Material
- Cationic Arylation. I. Phenylation of Substituted Benzenes with Benzenediazonium Tetrafluoroborate in Homogeneous Solution
- Downstream Control of Negative-Ion Plasma Parameters in Helicon Discharge