Ultra-Water Repellency of Films Prepared by Capacitively Coupled C2H2F2/Ar Discharge Plasma
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概要
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Ultra-water-repellent films with a water contact angle of about 150° are prepared by chemical vapor deposition in a capacitively coupled C2H2F2–Ar discharge plasma. Scanning electron microscopy shows that the prepared films have an irregular rough microstructure in which particles of submicron diameter are complicatedly intertwined. Fourier-transform infrared spectroscopy indicates that the films include components of the C–H and C–F bonds, characterized by having a hydrophobic nature. It is found that the water contact angle of the films is almost independent of C2H2F2 concentration at a total pressure of 100 Pa, preserving the ultra-water repellency.
- 2007-07-25
著者
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Ohtsu Yasunori
Department Of Electrical & Electronic Engineering Saga University
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Fujita Hiroharu
Department Of Electrical & Electronic Engineering Saga University
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Ohtsu Yasunori
Department of Electrical and Electronic Engineering, Saga University, Saga 840-8502, Japan
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Yamagami Nobuhisa
Department of Electrical and Electronic Engineering, Saga University, Saga 840-8502, Japan
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Fujita Hiroharu
Department of Electrical and Electronic Engineering, Saga University, Saga 840-8502, Japan
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