High-Density Radio-Frequency Plasma Sources Produced by Capacitive Discharge with Various Methods for Thin-Film Preparation
スポンサーリンク
概要
- 論文の詳細を見る
- 2010-10-01
著者
-
OHTSU Yasunori
Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Sag
-
Ohtsu Yasunori
Department Of Electrical And Electronic Engineering Graduate School Of Science And Engineering Saga
-
Ohtsu Yasunori
Department Of Electrical & Electronic Engineering Saga University
関連論文
- High-Density Radio-Frequency Plasma Sources Produced by Capacitive Discharge with Various Methods for Thin-Film Preparation
- Spatial Behavior of the Plasma Potential in a Magnetized Radio-Frequency Discharge from Emissive Probe Data(Gases, plasmas, electric discharges, and beams)
- Influence of Substrate Biasing on (Ba, Sr)TiO_3 Films Prepared by Electron Cyclotron Resonance Plasma Sputtering
- Energy Distribution of Ions Incident onto a Dc-Biased Substrate in Electron Cyclotron Resonance Sputtering Plasma for SrTiO_3 Thin Film Preparation
- Effect of RF-Biased Electrode on Microwave Plasma
- Measurement of Electron Energy Distribution Function in a Low-Pressure rf Discharge Plasma
- Modulation of Electron Velocity Distribution Function by Moving Cathode Sheath in a Low-Pressure rf Discharge
- CF_3, CF_2 and CF Radical Measurements in RF CHF_3 Etching Plasma Using Infrared Diode Laser Absorption Spectroscopy ( Plasma Processing)
- Ar/O_2 gas pressure dependence of atomic components of zirconia prepared by intermittent zirconium arc PBII&D
- Characteristics of Hole Plasma in the Presence of Ion Beam Injection
- Temporal Behavior of Charged Particles in a Radio Frequency Afterglow Plasma Containing Negative Ions
- Ion Collection by a Hollow Probe in ECR Microwave Plasma under a Divergent Magnetic Field
- High-density radio-frequency plasma sources produced by capacitive discharge with various methods for thin-film preparation (特集 日本のプラズマ研究最前線)
- Inductively Coupled Plasma by means of a Novel External Antenna
- Dust Particles Levitation near a Powered Electrode in a Capacitively Coupled RF Plasma
- Influence of Xe Gas Concentration on Plasma Parameters and Luminance Characteristics in Fluorescent Lamps driven by an Inductively Coupled Radio Frequency Discharge Using Ne / Xe Mixture Gases
- Development of Compact Ozonizer by Barrier Discharge for High Concentration Ozone Generation
- Energy Distribution Functions of Ions Impacted on a Negatively Biased Substrate in an Electron Cyclotron Resonance Microwave Plasma
- Potential Structure of Positively Biased Oscillating Substrate in a Low Pressure Plasma
- Sheath structure of the oscillating substrate in a collisionless plasma
- Ultra-Water Repellency of Films Prepared by Capacitively Coupled C2H2F2/Ar Discharge Plasma
- Annular Profile of Dust Density near RF-Powered Electrode in a Capacitively Coupled Plasma
- Measurements of Ion Energy Distribution Functions in an Radio Frequency Plasma Excited with an m = 0 Mode Helical Antenna and Thin Film Preparation
- Potential Oscillations in an Electronegative Plasma Driven by an Asymmetry RF Discharge
- Influences of Gap Distance on Plasma Characteristics in Narrow Gap Capacitively Coupled Radio-Frequency Discharge
- Time-Averaged Energy Distribution Function of Ions Impacted on an RF-biased Substrate in Electron Cyclotron Resonance Microwave Plasma
- Energy Distribution of Ions Incident onto a Dc-Biased Substrate in Electron Cyclotron Resonance Sputtering Plasma for SrTiO3 Thin Film Preparation
- High Ozone Generation with a High-Dielectric-Constant Material