Plasma Chemical Vaporization Machining (CVM) for Fabrication of Optics

スポンサーリンク

概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-07-15

著者

• Yamamura K

  Kyoto Univ. Kyoto

• Yamauchi Kazuto

  Department Of Precision Science And Technology Graduate School Of Engineering Osaka University

• Mori Y

  Research Center For Ultra-precision Science And Technology Graduate School Of Engineering Osaka Univ

• Mori Yusuke

  Graduate School of Engineering, Osaka University

• Shibata Norio

  Nikon Corporation

• Mori Yoshihiro

  Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.

• Mori Y

  Osaka Univ. Suita Jpn

• TAKINO Hideo

  Nikon Corporation

• ITOH Hiroshi

  Nikon Corporation

• KOBAYASHI Teruki

  Nikon Corporation

• TANAKA Hiroaki

  Nikon Corporation

• EBI Masami

  Nikon Corporation

• YAMAMURA Kazuya

  Depatment of Precision Science & Technology, Faculty of Engineering, Osaka University

• SANO Yasuhisa

  Depatment of Precision Science & Technology, Faculty of Engineering, Osaka University

• MORI Yuzo

  Depatment of Precision Science & Technology, Faculty of Engineering, Osaka University

• Takino Hideo

  Nikon Corp.

• Sano Y

  Division Of Precision Science And Technology And Applied Physics Graduate School Of Engineering Osak

• Takino H

  Nikon Corp. Kanagawa Jpn

• Yamamura K

  Graduate School Of Science Kyoto University

• Yoshimura Kazuyoshi

  Graduate School Of Science Kyoto University

• Mori Yuzo

  Department Of Mechanical Engineering Kochi National College Of Technology

• Yamamura Kazuya

  Osaka University

関連論文

• 22pGQ-6 超平坦化加工した4H-SiC(0001)表面上のグラフェン(22pGQ 表面界面構造,領域9(表面・界面,結晶成長))
• 21pPSA-27 4H-SiC(0001)表面上のグラフェン形成過程の組成・構造解析(21pPSA 領域9ポスターセッション,領域9(表面・界面,結晶成長))
• 大気圧プラズマによるエッチングを応用した種々の加工法とその特性 (特集 最近の興味深いビーム加工技術と将来動向)
• Advanced Kirkpatrick-Baez ミラー光学系の開発
• 硬X線ナノ集光ビーム用波面誤差算出法の開発
• Unraveling Genuine First Order Bulk Valence Transition and Kondo Resonance Behaviors in YbInCu_4 by High Energy Photoelectron Spectroscopy
• 触媒基準エッチング法(CAtalyst Referred Ething: CARE)の開発--SiC, GaN基板加工への応用 (特集 グリーンエネルギー時代を支える先進加工技術とその課題)
• X線自由電子レーザ集光ミラーの開発
• 触媒基準エッチング法
• 22pTC-3 超高精度ミラーによる硬X線ナノビーム形成とその応用(領域10シンポジウム主題:X線・電子線による回折イメージングの最前線,領域10,誘電体,格子欠陥,X線・粒子線,フォノン物性)
• 高精度非球面ミラーの加工技術
• High-Spatial-Resolution Machining Utilizing Atmospheric Pressure Plasma : Machining Characteristics of Silicon
• Polishing Characteristics of Silicon Carbide by Plasma Chemical Vaporization Machining
• Ultraprecision Machining Utilizing Numerically Controlled Scanning of Localized Atmospheric Pressure Plasma
• 23aQE-5 High resolution hard X-ray(8keV) photoelectron spectroscopy of genuine bulk electronic structures of V and Yb compounds
• 高分解能硬X線顕微鏡のためのミラーマニピュレータの開発 : 硬X線領域における50nm以下の回折限界集光の実現
• EEM (Elastic Emission Machining) によるナノ精度加工
• 超純水・高速せん断流による洗浄法の開発(第2報) : 超純水・高速せん断流によるCu除去メカニズムの研究
• 超純水・高速せん断流によるSi基板洗浄法の研究 : Si基板表面のDOP汚染の洗浄効果
• 硬X線ナノ集光ミラーの形状計測
• EEM(Elastic Emission Machining)によるナノ精度加工 (特集 モノづくりと混相流(6)機能性微粒子技術を支える現象・要素技術)
• 硬X線ナノ集光用超高精度楕円ミラーの作製と1次元集光性能の評価
• EEM(Elastic Emission Machining)プロセスにおける微粒子表面の形態が加工表面に及ぼす影響
• EEM(Elastic Emission Machining)プロセスにおける加工液がSi(001)表面のマイクロラフネスに及ぼす影響
• EEM(Elastic Emission Machining)による4H-SiC(0001)表面の平滑化
• EEM(Elastic Emission Machining)によるSi(001)表面の平坦化(第2報) : 加工表面の原子像観察と構造評価
• EEM(Elastic Emission Machining)によるSi(001)表面の平坦化(第1報) : 半導体表面の超平坦化のための超清浄EEMシステムの開発
• 硬X線用斜入射平面ミラーの形状誤差が反射X線強度・位相分布に及ぼす影響の波動光学的評価
• Intermediate-Valence Behavior of YbCu_Al_x around Quantum Critical Point Measured by Resonant Inelastic X-ray Scattering at Yb L_3 Absorption Edge(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
• Density of States of Single-Walled Carbon Nanotubes Grown on Metal Tip Apex
• Scanning Tunneling Microscopy and Spectroscopy Study of a Steep Facet Surface on Ge Nanocrystal Grown on Si(111)
• Scanning Tunneling Spectroscopy Study of the ZnO(0001)-Zn Surface
• Electrical Characterization of Metal-Coated Carbon Nanotube Tips
• 高精度X線ミラーのための干渉計を利用した形状計測システムの開発
• プラズマCVMおよびEEMによるシンクロトロン放射X線用楕円ミラーの作製と集光特性の評価
• 超純水・高速せん断流による洗浄法の開発(第1報) : Si基板表面のCu汚染の洗浄効果
• Application of Femtosecond Laser Ablation for Detaching Grown Protein Crystals from Glass Capillary Tube(METHODS)
• Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors
• Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
• 光散乱法を用いたSiウエハ表面のウエット洗浄によるナノパーティクル評価
• 原子レベルで平坦な表面の創成技術
• Formation of Vertically Aligned Carbon Nanotubes by Dual-RF-Plasma Chemical Vapor Deposition : Surfaces, Interfaces, and Films
• 超平坦化加工を施した4H-SiC(0001)表面 : 高品質グラフェン作製への応用
• 円すいころ軸受ころ大端面の最適曲率半径(機械要素,潤滑,設計,生産加工,生産システムなど)
• 円すいころ軸受ころ大端面の最適曲率半径 (特集 環境対応) -- (環境対応商品/技術)
• High-Quality Organic 4-Dimethylamino-N-Methyl-4-Stilbazolium Tosylate (DAST) Crystal for Electro-Optic Measurement(Special Issue on Recent Progress in Microwave and Millimeter-wave Photonics Technologies)
• Electro-Optic Measurement Using High-Quality : 4-dimethylamino-N-methyl-4-stilbazolium Tosylate (DAST) Crystal
• 2P-119 ヒトIgGに結合するRNAアプタマー複合体の立体構造(核酸・相互作用,複合体,第46回日本生物物理学会年会)
• Solution-Stirring Method Improves Crystal Quality of Human Triosephosphate Isomerase(ENZYMOLOGY, PROTEIN ENGINEERING, AND ENZYME TECHNOLOGY)
• Processing of Membrane Protein Crystal Using Ultraviolet Laser Irradiation(METHODS, Advances in Biomedical Science and Engineering)
• Femtosecond Laser Processing of Protein Crystals in Crystallization Drop
• 超純水・高速せん断流による洗浄法の開発(第2報) : 超純水・高速せん断流によるCu除去メカニズムの研究
• Characterization of Homoepitaxial Diamond Films Grown from Carbon Monoxide
• 2P007 大腸菌由来スペルミジンアセチルトランスフェラーゼのX線結晶構造解析(蛋白質-構造,第48回日本生物物理学会年会)
• 24aPS-73 4H-SiC(0001)上のグラフェン形成過程の追跡と層分解構造解析(24aPS 領域9ポスターセッション,領域9(表面・界面,結晶成長))
• Growth and Optical Characterization of Cr^YAB and Cr^YGAB Crystal for New Tunable and Self-Frequency Doubling Laser
• Metal-coated Carbon Nanotube Tips for Nanoscale Electrical Measurements
• Metal-Coated Carbon Nanotube Tip for Scanning Tunneling Microscope
• 円筒ころ軸受における対数クラウニングの公差設計
• 次世代の超精密加工 : 原子制御製造プロセスの創出に向けて(超精密加工専門委員会,専門委員会・分科会研究レビュー)
• 円筒ころ軸受における部分円弧クラウニングと対数クラウニングの実験的比較(機械要素,潤滑,工作,生産管理など)
• Low Temperature BST-CVD Process for the Concave-Type Capacitors Designed for Logic-Base-Embedded DRAMs
• Extendibility of Ta_2O_5 Metal-Insulator-Metal Capacitor Using Ru Electrode
• Ru-Ta_2O_5MIM Capacitor toward 0.1μm DRAM Cell
• X線自由電子レーザー用大型集光ミラーの開発
• 未踏の光源、X線自由電子レーザー開発に挑む！
• Investigation of the Gd Variation of Gd_xY_Ca_4O(BO_3)_3 Crystal and Its Application : Structure and Mechanical and Thermal Properties of Condensed Matter
• Photoinduced Damage in Gd_Y_xCa_4O(BO_3)_3 Crystals
• Structural Study of Chemical-Vapor-Deposited Diamond Surface by High-Resolution Electron Microscopy
• First-Principles Evaluations of Machinability Dependency on Powder Material in Elastic Emission Machining
• Plasma Chemical Vaporization Machining (CVM) for Fabrication of Optics
• Electron Affinity of Single-Crystalline Chemical-Vapor-Deposited Diamond Studied by Ultraviolet Synchrotron Radiation
• Synthesis of Bulk GaN Single Crystals Using Na-Ca Flux : Semiconductors
• Slope Nucleation Method for the Growth of High-Quality 4-Dimethylamino-Methyl-4-Stibazolim-Tosylate (DAST) Crystals
• ZnCdSe/ZnSSe/ZnMgSSe SCH Laser Diode with a GaAs Buffer Layer
• ZnCdSe/ZnSe/ZnMgSSe Separate-Confinement Heterostructure Laser Diode with Various Cd Mole Fractions
• 491-nm ZnCeSe/ZnSe/ZnMgSSe SCH Laser Diode with a Low Operating Voltage
• Effect of Low-Frequency Vibration Method on Growing Huntite-Borate Crystals
• Incoherence Effect of Single-Mode Pump on Second-Harmonic Generation
• Theoretical Analysis of Multimode Pumped Second-Harmonic Generation
• High-Efficiency Intracavity Frequency-Doubled CW and Tunable Ti:Sapphire Laser
• Internal Resonating of Second-Harmonic Wave by Scanning Fundamental Cavity Length
• Nonlinear Optical Properties of Cesium Lithium Borate
• Second-Order Piezoresistance Coefficients of p-Type Silicon
• High-Efficiency ZnCdSe/ZnSSe/ZnMgSSe Green Light-Emitting Diodes
• A Palm-Size Ultraviolet Laser Using a Combination of a Monolithic Wavelength Converter and an Optical Fiber
• 355-nm UV Light Generation in High-Quality CsB_3O_5 Fabricated by Post-Growth Heat Treatment
• Influence of Crystallinity on the Bulk Laser-Induced Damage Threshold and Absorption of Laser Light in CsLiB_6O_ Crystals : Optics and Quantum Electronics
• Crystal Growth of Thermoelectric Material Na_xCoO_ by a Flux Method : Structure and Mechanical and Thermal Properties of Condensed Matter
• Surface replication with one-nanometer-level smoothness by a nickel electroforming process
• The Growth of K_2Al_2B_2O_7 (KAB) Crystal by Modified Middle Seeded Solution Growth (MSSG) Method : Structure and Mechanical and Thermal Properties of Condensed Matter
• A New Emission Band Related to EL2 in GaAs
• Photoluminescence Spectra of Silver-Doped ZnSe Grown by MBE
• Planarization of GaN(0001) Surface by Photo-Electrochemical Method with Solid Acidic or Basic Catalyst
• Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma
• Wavefront Control System for Phase Compensation in Hard X-ray Optics
• Improvement of Removal Rate in Abrasive-Free Planarization of 4H-SiC Substrates Using Catalytic Platinum and Hydrofluoric Acid
• Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
• Morphological Stability of Si(001) Surface Immersed in Fluid Mixture of Ultrapure Water and Silica Powder Particles in Elastic Emission Machining
• Bias-Assisted Photochemical Planarization of GaN(0001) Substrate with Damage Layer

もっと見る 閉じる

スポンサーリンク