硬X線ナノ集光用超高精度楕円ミラーの作製と1次元集光性能の評価

概要

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In this study, we designed, fabricated and evaluated a hard X-ray focusing mirror having the performance that the full width at half maximum in the intensity profile of a focused beam is 36nm at X-ray energy of 15keV. By using wave-optical simulator, the relationship between surface figure error characteristics and deformations of intensity profiles was investigated. Simulation results indicated that figure accuracy of 4nm (peak-to-valley (PV)) was necessary in spatial wavelength ranges longer than 5mm to realize the ideal focal size. Focusing on surface figuring in the spatial wavelength ranges, the focusing mirror was fabricated by computer controlled plasma chemical vaporization machining (PCVM) and elastic emission machining (EEM), on the basis of the surface profile obtained by combining two surface profiles, which are measured by mircostitching interferometry (MSI) and relative angle determinable stitching interferomety (RADSI). We carried out line focusing tests on the fabricated mirror at the 1-km-long beamline of SPring-8. A full width at half maximum of 40nm was achieved in the focal beam profile under the best focusing conditions.
社団法人精密工学会の論文
2005-09-05