Sano Y | Division Of Precision Science And Technology And Applied Physics Graduate School Of Engineering Osak

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概要

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著作論文

High-Spatial-Resolution Machining Utilizing Atmospheric Pressure Plasma : Machining Characteristics of Silicon
Polishing Characteristics of Silicon Carbide by Plasma Chemical Vaporization Machining
Ultraprecision Machining Utilizing Numerically Controlled Scanning of Localized Atmospheric Pressure Plasma
Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors
Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
High Performance Low Temperature Polycrystalline Silicon Thin Film Transistors on Non-alkaline Glass Produced Using Diode Pumped Solid State Continuous Wave Laser Lateral Crystallization
High-Performance Polycrystalline Silicon Thin Film Transistors on Non-Alkali Glass Produced Using Continuous Wave Laser Lateral Crystallization : Semiconductors
Plasma Chemical Vaporization Machining (CVM) for Fabrication of Optics
A Study of GaAs Digital ICs on Si Substrates
Effect of Bias Sputtering on W and W-Al Schottky Contact Formation and its Application to GaAs MESFETs : III-V Compound Semiconductors Devices and Materials(Solid State Devices and Materials 1)
Influence of Annealing Method on Microscopic One-to-One Correlation between Threshold Voltage of GaAs MESFET and Dislocation
The Dependence of Threshold Voltage Scattering of GaAs MESFET on Annealing Method
A New Insulated-Gate Inverted-Structure Modulation-Doped AlGaAs/GaAs/N-AlGaAs Field-Effect Transistor
Improved Threshold Voltage Uniformity in GaAs MESFET Using High Purity MOCVD-Grown Buffer Layer as a Substrate for Ion Implantation
Surface replication with one-nanometer-level smoothness by a nickel electroforming process

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