Effect of Bias Sputtering on W and W-Al Schottky Contact Formation and its Application to GaAs MESFETs : III-V Compound Semiconductors Devices and Materials(<Special Section>Solid State Devices and Materials 1)
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1988-11-20
著者
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Kimura T
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Sakuta M
Department Of Biology Ochanomizu University
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Sekino Yuko
R & D Group Oki Electric Incustry Co. Ltd
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Sano Y
Division Of Precision Science And Technology And Applied Physics Graduate School Of Engineering Osak
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INOKUCHI Kazuyuki
Electronic Components Group, Oki Electric Industry Co., Ltd.,
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SEKINO Yuko
R & D Group, Oki Electric Incustry Co.,Ltd
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KIMURA Tamotsu
R & D Group, Oki Electric Incustry Co.,Ltd
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INOKUCHI Kazuyuki
R & D Group, Oki Electric Incustry Co.,Ltd
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SANO Yoshiaki
R & D Group, Oki Electric Incustry Co.,Ltd
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SAKUTA Masaaki
R & D Group, Oki Electric Incustry Co.,Ltd
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Inokuchi K
Electronic Components Group Oki Electric Industry Co. Ltd.
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