Epitaxial Si on Al_2O_3 Films Grown with O_2 Gas by the Ultrahigh-Vacuum Chemical Vapor Deposition Method
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概要
- 論文の詳細を見る
By an improved Al_2O_3(100) growth on Si(100) using O_2 gas instead of N_2O gas, high-crystalline quality silicon on insulator (SOI) and multistacked SOI structures were successfully fabricated on a 2-inch Si(100) wafer by the ultrahigh-vacuum chemical vapor deposition (UHV-CVD) method. The surface morphology of the Si top layer of the fabricated SOI structure is better than that of the silicon on sapphire (SOS) structure grown by the UHV-CDV method. The transistor action was confirmed from the electrical properties of the MOSFET, and the field effect mobility of 748 cm^2/V s was obtained. These results were similar to those obtained from bulk Si. This improved Si top layer of SOI and multistacked SOI structures is due to the improved surface morphology and crystalline quality of the Al_2O_3 layer grown on Si with O_2 gas.
- 社団法人応用物理学会の論文
- 1998-03-30
著者
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KIMURA Takayuki
Department of Electrical and Electronic Engineering, Faculty of Engineering, Niigata University
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MORIYASU Yoshitaka
Department of Material Physics, Faculty of Engineering Science, Osaka University
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Kimura T
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Ishida Makoto
Department Of Applied Chemistry & Biochemistry Faculty Of Engineering Kumamoto University
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Kimura T
Institute Of Applied Physics 21th Century Coe Nano Project University Of Tsukuba
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Sengoku Atsuhiro
Research Center For Quantum Effect Electronics Tokyo Institute Of Technology
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YAGINUMA Hideki
Department of Electrical and Electronic Engineering, Toyohashi University of Technology
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SENGOKU Atsuhiro
Department of Electrical and Electronic Engineering, Toyohashi University of Technology
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Kimura Takayuki
Department Of Electrical And Electronic Engineering Faculty Of Engineering Niigata University
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Kimura Tatsumi
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Yaginuma Hideki
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
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Moriyasu Yoshitaka
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
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KIMURA Takayuki
Department of Dermatology, Faculty of Medicine, University of Tokyo
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