Fabrication of the Si/Al_2O_3/SiO_2/Si Structure by Using the O_2 Annealed Al_2O_3/Si Structure
スポンサーリンク
概要
- 論文の詳細を見る
- 1999-09-20
著者
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Hori H
Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn
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Hori H
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Ishida Makoto
Department Of Applied Chemistry & Biochemistry Faculty Of Engineering Kumamoto University
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Sawada Kazuaki
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
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Sawada Kazuaki
Research Institute Of Electronics Shizuoka University
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Kondo Fumitaka
Department Of Electrical And Electonic Engineering Toyohashi University Of Technology
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HORI Hirotsugu
Department of Electrical and Electonic Engineering, Toyohashi University of Technology
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AKAI Daisuke
Department of Electrical and Electonic Engineering, Toyohashi University of Technology
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Akai Daisuke
Department Of Electrical And Electonic Engineering Toyohashi University Of Technology
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Sawada Kazuaki
Department of Electric and Electronic Engineering, Toyohashi University of Technology, 1-1 Hibarigaoka, Tempaku-cho, Toyohashi, Aichi 441-8580, Japan
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Sawada Kazuaki
Department of Electric and Electronic Engineering, Toyohashi University of Technology
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