Nano-Fabrication on GaAs Surface by Resist Process with Scanning Tunneling Microscope Lithography (<Special Issue> Scanning Tunneling Microscopy)
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-06-30
著者
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HORI Hidenobu
School of Materials Science,JAIST
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Yamada S
Electronic Imaging And Devices Research Laboratory Fuji Xerox
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Yamada So
Electronic Imaging And Devices Research Laboratory Fuji Xerox Co. Lid.
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Aoki N
School Of Materials Science Japan Advanced Institute Of Science And Technology-hokuriku
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Aoki Nobuyuki
Department Of Materials Technology Chiba University
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Hori H
Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn
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Hori H
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Yamada Shoji
Shizuoka Institute Of Science And Technology
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YAMADA Satoru
Research Center for Heavy Ion Medicine, Gunma University
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Aoki N
Chiba Univ. Chiba Jpn
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Yamada S
Research Center For Heavy Ion Medicine Gunma University
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HIRONAKA Katsuya
School of Materials Science, Japan Advanced Institute of Science and Technology-Hokuriku
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AOKI Nobuyuki
School of Materials Science, Japan Advanced Institute of Science and Technology-Hokuriku
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YAMADA Syoji
School of Materials Science, Japan Advanced Institute of Science and Technology-Hokuriku
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Yamada Syoji
School Of Materials Science Jaist-hokuriku
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Hori Hidenobu
School Of Material Science Japan Advanced Institute Of Science And Technology
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Hironaka K
Sony Corp. Kanagawa Jpn
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