Bonding Process for Nanoscale Wiring Using Carbon Nanotube by STM Tip
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概要
- 論文の詳細を見る
A nano-scale bonding process using a multi-wall carbon nanotube (CNT) has been successfully applied in a scanning electron microscope (SEM)/scanning tunneling microscope (STM) combined system. Under the SEM observation, a Ti-coated STM tip was approached onto a CNT bridging Ti pads, which is patterned with a 4 μm gap on a SiO2 surface, to investigate the conduction property of the CNT. A voltage pulse of 12 V peak and 50 μs duration was applied in order to deposit Ti clusters onto the CNT, which is well known as a field evaporation process in the STM regime. The two-terminal current-voltage characteristics of the CNT have been improved from a nonlinear behavior at 2.5 V of 208 k$\Omega$ to a linear one of 1.8 k$\Omega$.
- 2003-04-15
著者
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Aoki Nobuyuki
Department Of Electronics And Mechanical Engineering Chiba University
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Ida Tetsuya
Semiconductor Laboratory Riken
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Yamada Syoji
School Of Materials Science Jaist-hokuriku
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Kida Michio
Department Of Materials Technology & Center For Frontier Electronics And Photonics Chiba Univers
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Ishibashi Koji
Semiconductor Laboratory Riken
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TAKAYAMA Junpei
Department of Materials Technology & Center for Frontier Electronics and Photonics, Chiba University
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HORIUCHI Kazunaga
Corporate Research Center, Fuji-Xerox Co., Ltd.
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OCHIAI Yuichi
Department of Electronics and Mechanical Engineering, Chiba University
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Ochiai Yuichi
Department of Materials Technology & Center for Frontier Electronics and Photonics, Chiba University, 1-33 Yayoi, Inage, Chiba 263-8522, Japan
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Aoki Nobuyuki
Department of Materials Technology & Center for Frontier Electronics and Photonics, Chiba University, 1-33 Yayoi, Inage, Chiba 263-8522, Japan
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Takayama Junpei
Department of Materials Technology & Center for Frontier Electronics and Photonics, Chiba University, 1-33 Yayoi, Inage, Chiba 263-8522, Japan
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Ida Tetsuya
Semiconductor Laboratory, RIKEN, 2-1 Hirosawa, Wako, Saitama 351-0198, Japan
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Horiuchi Kazunaga
Corporate Research Center, Fuji-Xerox Co., Ltd., 430 Sakai, Nakai, Ashigarakami-gun, Kanagawa 259-0157, Japan
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Yamada Syoji
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)-Hokuriku, 1-1 Asahidai, Tatsunokuchi, Ishikawa 923-1211, Japan
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Kida Michio
Department of Materials Technology & Center for Frontier Electronics and Photonics, Chiba University, 1-33 Yayoi, Inage, Chiba 263-8522, Japan
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Ishibashi Koji
Semiconductor Laboratory, RIKEN, 2-1 Hirosawa, Wako, Saitama 351-0198, Japan
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