Preparation and Electrochromic Properties of RF-Sputtered NiO_x Films Prepared in Ar / 0_2 / H_2 Atmosphere

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-12-15

著者

• Yamada S

  Electronic Imaging And Devices Research Laboratory Fuji Xerox

• Yamada So

  Electronic Imaging And Devices Research Laboratory Fuji Xerox Co. Lid.

• Yamada Shoji

  Shizuoka Institute Of Science And Technology

• KITAO Michihiko

  Research Institute of Electronics, Shizuoka University

• IZAWA Kuniyuki

  Research Institute of Electronics, Shizuoka University

• URABE Kazuo

  Research Institute of Electronics, Shizuoka University

• KOMATSU Takeshi

  Shizuoka Industrial Research Institute of Shizuoka Prefecture

• KUWANO Saburou

  Shizuoka Industrial Research Institute of Shizuoka Prefecture

• Izawa Kuniyuki

  Research Institute Of Electronics Shizuoka University

• YAMADA Satoru

  Research Center for Heavy Ion Medicine, Gunma University

• 小松 剛

  静岡県静岡工業技術センター

• Komatsu Takeshi

  Industrial Research Institute Of Shizuoka Prefecture

• Urabe Kazuo

  Research Institute Of Electronics Shizuoka University

• Yamada S

  Research Center For Heavy Ion Medicine Gunma University

• Kitao M

  Shizuoka Univ. Hamamatsu Jpn

• Kitao Michihiko

  Research Institute Of Electronics Shizuoka University

• Urabe K

  Research Institute Of Electronics Shizuoka University

関連論文

• Preparation and Electrochromic Properties of RF-Sputtered NiO_x Films Prepared in Ar / 0_2 / H_2 Atmosphere
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