Device Simulation with Quasi Three-Dimensional Temperature Analysis for Short-Channel Poly-Si Thin-Film Transistor
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-01-30
著者
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Yamada S
Electronic Imaging And Devices Research Laboratory Fuji Xerox
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Yamada So
Electronic Imaging And Devices Research Laboratory Fuji Xerox Co. Lid.
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Yamada So
Electronic Imaging And Devices Research Laboratory Fuji Xerox
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Koyanagi Mitsumasa
Research Center for Integrated Systems, Hiroshima University
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Matsumoto Takuji
Research Center For Integrated Systems Hiroshima University
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HASHIMOTO Takeshi
Research Center for Materials Science at Extreme Conditions and Graduate School of Engineering Scien
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Koyanagi Mitsumasa
Research Center For Integrated Systems Hiroshima University
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KATO Noriji
Electronic Imaging and Devices Research Laboratory, Fuji Xerox Co., Ltd.,
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SHIMATANI Tamio
Research Center for Integrated Systems, Hiroshima University
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Kato Noriji
Electronic Imaging And Devices Research Laboratory Fuji Xerox
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Shimatani Tamio
Department Of Machine Intelligence And System Engineering Intelligent System Design Laboratory Tohok
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Hashimoto Takeshi
Research Center For Integrated Systems Hiroshima University
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