Coupled Monte Carlo-Energy Relaxation Analysis of Hot Carrier Light Emission in Metal Oxide Semiconductor Field Effect Transistor's
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-12-30
著者
-
YOKOYAMA Seiji
School of Material Science, Japan Advanced Institute of Science and Technology
-
YOKOYAMA Shin
Research Center for Nanodevices and Systems, Hiroshima University
-
Yokoyama Seiji
School Of Material Science Japan Advanced Institute Of Science And Technology
-
Koyanagi Mitsumasa
Research Center for Integrated Systems, Hiroshima University
-
Mori H
Osaka Univ. Osaka Jpn
-
Yokoyama Shin
Research Center For Integrated Systems Hiroshima University
-
Kurino Hiroyuki
Research Center For Integrated Systems Hiroshima University
-
Koyanagi Mitsumasa
Research Center For Integrated Systems Hiroshima University
-
KIBA Hiroyuki
Research Center for Integrated Systems, Hiroshima University
-
MORI Hiroki
Research Center for Integrated Systems, Hiroshima University
-
YAMAGUCHI Ken
Central Research Laboratory, Hitachi, Lid.
-
Kiba Hiroyuki
Research Center For Integrated Systems Hiroshima University
-
Yokoyama S
Kyushu Univ. Fukuoka Jpn
-
Yamaguchi Ken
Central Research Laboratory Hitachi Ltd.
-
Mori Hiroki
Research Center For Integrated Systems Hiroshima University
-
Yamaguchi Ken
Central Research Laboratory
-
Yamaguchi Ken
Central Research Laboratory Hitachi Lid.
関連論文
- Low Voltage Saturation of Ob(Zr_xTi_O_3 Films on(100)Ir/(100)(ZrO_2)_(Y_2O_3)_x/(100)Si Substrate Structure Prepared by Reactive Sputtering
- Imprint Property of Optical Mach-Zehnder Interferometer Using Sputter Deposited (Ba,Sr)TiO_3 at Low Temperature
- Low Temperature Fabrication of Monolithic Mach-Zehnder Optical Modulator on Silicon using Sputtered (Ba,Sr)TiO_3 and Mechanism of Transient Response
- Structure and Optical Band-Gap Energies of Ba_Sr_TiO_3 Thin Films Fabricated by RF Magnetron Plasma Sputtering
- Groove-Buried Optical Waveguides Based on Metal Organic Solution-Derived Ba_Sr_TiO_3 Thin Films
- Structural and Optical Properties of Electro-Optic Material : Sputtered (Ba,Sr)TiO_3
- High-Rate GaAs Epitaxial Lift-Off Technique for Optoelectronic Integrated Circuits
- High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
- Single-Chip Integration of Light-Emitting Diode, Waveguide and Micrormirrors
- Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
- Evaluation of Plasma-Induced Damage by Medium-Energy Ion Scattering
- BF^+_2 Ion Implantation into Very-Low-Temperature Si Wafer
- Chemical Bonding Features of Fluorine and Boron in BF^+_2 -Ion-Implanted Si
- Comparative Studies of Perfluorocarbon Alternative Gas Plasmas for Contact Hole Etch
- Quantitative Evaluation of Dopant Loss in 5-10 keV As Ion Implantation for Low-Resistive, Ultrashallow Source/Drain Formation
- An Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
- Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
- Optically Interconnected Kohonen Net for Pattern Recognition
- High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
- New RAM-bus Memory System with Interchip Optical Interconnection
- Micron-Size Optical Waveguide for Optoelectronic Integrated Circuit
- Medium-Energy Ion Spectroscopy Using Ion Implanter
- Electron Microscopic Study on the Initial Stages of (111)-Oriented Diamonds Grown on Pt Substrates
- New Ar-Plasma Cleaning Process for Reduction of Al/TiSi_2 Contact Resistance
- Bipolar Voltage Pulse Induced Current : A Means for Reliable Extraction of Interface Trap Distribution in Ultrathin Oxides MOS Structures
- Determination of Valence Band Alignment at Ultrathin SiO_2/Si Interfaces by High-Resolution X-Ray Photoelectron Spectroscopy
- Valence Band Alignment at Ultra-Thin SiO_2/Si(111) Interfaces as Determined by High-Resolution X-Ray Photoelectron Spectroscopy
- Valence Band Alignment at Ultra-Thin SiO_2/Si(111) Interfaces as Determined by High-Resolution X-Ray Photoelectron Spectroscopy
- Organic Contamination Dependence of Process-Induced Interface Trap Generation in Ultrathin Oxide Metal Oxide Semiconductor Transistors
- Fabrication Technologies for Double-SiO_2-Barrier Metal-Oxide-Semiconductor Transistor with a Poly-Si Dot
- Thickness Dependence of Material Properties of Epitaxial Pb(Zr_xTi_)O_3 Films on Ir/(100) (ZrO_2)_(Y_2O_3)_x(100)Si Structures
- Calculation of Electrical Properties of Novel Double-Barrier Metal Oxide Semiconductor Transistors
- Effects of Hydrogen and Bias on Single-Crystal Al Growth on Vicinal Si by DC Magnetron Sputtering
- Influence of Organic Contaminant on Trap Generation in Thin SiO_2 of Metal-Oxide-Semiconductor Capacitors
- Influence of Organic Contaminant on Breakdown Characteristics of MOS Capacitors with Thin SiO_2
- Effect of Light Irradiation on Native Oxidation of Silicon Surface
- Influence of Organic Contaminant on Breakdown Characteristics of MOS Capacitors with Thin SiO_2
- Fabrication of Diamond Films at Low Pressure and Low-Temperature by Magneto-Active Microwave Plasma Chermical Vapor Deposition ( Plasma Processing)
- Design of Optically Coupled Three-Dimensional Content Addressable Memory
- Control of Fine Particulate and Gaseous Contaminants by UV/Photoelectron Method (Special Issue on Scientific ULSI Manufacturing Technology)
- Coupled Monte Carlo-Energy Relaxation Analysis of Hot Carrier Light Emission in Metal Oxide Semiconductor Field Effect Transistor's
- Carrier Mobility in Metal-Oxide-Semiconductor Field Effect Transistor with Atomic-Layer-Deposited Si-Nitride Gate Dielectrics
- Conduction Mechanism in Extremely Thin Poly-Si Wires : Width Dependence of Coulomb Blockade Effect
- Low-Temperature Selective Deposition of Silicon by Time-Modulation Exposure of Disilane and Formation of Silicon Nanowires
- Investigation of Surface Contamination on Silicon Oxide after Hydrofluoric Acid Etching by Noncontact Capacitance Method
- Evaluation of Surface Contamination by Noncontact Capacitance Method under UV Irradiation
- Influence of Wafer Material on Defect Generation During Deep Submicron LOCOS Process
- Fabrication of spin-coat optical waveguides for optically interconnected LSI and influence of fabrication process on lower layer MOS capacitors
- Optical Modulator Using Metal-Oxide-Semiconductor Type Si Ring Resonator
- Magneto-optic Effect in Amorphous Bi_3Fe_5O_ Waveguide Sputtered at Room Temperature
- Photoelastic Effect in Silicon Ring Resonator
- Layer-by-Layer Growth of Bi-Sr-Ca-Cu-O Superconducting Films by Molecular Beam Epitaxy
- Atomic Layer Growth of Bi-Sr-Ca-Cu-O by Molecular Beam Epitaxy Using Ozone under UV Irradiation
- Continuous GaAs Film Growth on Epitaxial Si Surface in Initial Stage of GaAs/Si Heteroepitaxy
- 1.5 μm-Long-Wavelength Multiple Quantum Well Laser on a Si Substrate
- Device Simulation with Quasi Three-Dimensional Temperature Analysis for Short-Channel Poly-Si Thin-Film Transistor
- Evaluation of Front-Opening Unified Pod with Attached UV/Photocatalyst Cleaning Unit
- Low-Temperature Operation of Polycrystalline Silicon Thin-Film Transistors
- Design and Simulation of Silicon Ring Optical Modulator with p/n Junctions along Circumference
- Low Temperature Fabrication of Diamond Films with Nanocrystal Seeding
- Sensitivity Improvement of Biosensors Using Si Ring Optical Resonators
- Detection of Antigen--Antibody Reaction Using Si Ring Optical Resonators Functionalized with an Immobilized Antibody-Binding Protein
- A Study of Mach--Zehnder Interferometer Type Optical Modulator Applicable to an Accelerometer
- Fabrication of Si Nanowire Field-Effect Transistor for Highly Sensitive, Label-Free Biosensing
- Si Ring Optical Resonators for Integrated On-Chip Biosensing
- Two-Dimensional Device Simulation for Polycrystalline Silicon Thin-Film Transistor
- Resist and Sidewall Film Rermoval after AT Reactive Ion Etching (RIE) Employing F+H_2O Downstream Ashing
- Fabrication of High-Density Diamond Nanotips by Electron Beam Lithography
- Implanted Antimony Precipitation in Silicon Studied by Medium-Energy Ion Scattering
- Investigation of Surface Contamination on Silicon Oxide after Hydrofluoric Acid Etching by Noncontact Capacitance Method
- Comparative Studies of Perfluorocarbon Alternative Gas Plasmas for Contact Hole Etch
- Self-Limiting Atomic-Layer Selective Deposition of Silicon Nitride by Temperature-Controlled Method
- Compact Branched Optical Waveguides Using High-Index-Contrast Stacked Structure
- Stacked Optical Branched Waveguides for Optical Interconnection on Si Chips
- Single-Crystal Growth of Al(110) on Vicinal Si(100) in Ultra-High-Vacuum Sputtering System
- Influence of Sputtering Geometry on Crystallinity of Al(110) Thin Films on Offset (100)Si
- Race-Track Optical Ring Resonators with Groove Coupling
- Design and Simulation of Ring Resonator Switches using Electro-Optic Materials
- Compact Multi-Mode Optical Ring Resonators for Interconnection on Si Chips
- Characterization of Ge Photodiodes Fabricated on Vicinal Si Substrate
- Optimum Atomic Spacing for AlAs Etching in GaAs Epitaxial Lift-Off Technology
- Contact-Hole Etching with NH3-Added C5F8 Pulse-Modulated Plasma
- SiO2 Hole Etching Using Perfluorocarbon Alternative Gas with Small Global Greenhouse Effect
- Silicon Ring Optical Modulator with p/n Junctions Arranged along Waveguide for Low-Voltage Operation (Special Issue : Solid State Devices and Materials (2))
- Design and Simulation of Ring Resonator Optical Switches using Electro-Optic Materials
- Anomalous Behavior of Interface Traps of Si MOS Capacitors Contaminated with Organic Molecules
- Magneto-Optic Effect in Amorphous Bi3Fe5O12 Waveguides Sputtered at Room Temperature
- Optically Interconnected Kohonen Net for Pattern Recognition
- Phosphorus-Assisted Low-Energy Arsenic Implantation Technology for N-Channel Metal–Oxide–Semiconductor Field-Effect Transistor Source/Drain Formation Process
- Organic Contamination Dependence of Process-Induced Interface Trap Generation in Ultrathin Oxide Metal Oxide Semiconductor Transistors
- Photoelastic Effect in Silicon Ring Resonators
- Evaluation of Front-Opening Unified Pod with Attached UV/Photocatalyst Cleaning Unit
- Effect of Light Irradiation on Native Oxidation of Silicon Surface
- Imprint Property of Optical Mach–Zehnder Interferometers Using (Ba,Sr)TiO3 Sputter-Deposited at 450 °C
- High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
- Fabrication of Spin-Coated Optical Waveguides for Optically Interconnected LSI and Influence of Fabrication Process on Underlying Metal–Oxide–Semiconductor Capacitors
- Compact Multimode Optical Ring Resonators for Interconnection on Silicon Chips
- Groove-Buried Optical Waveguides Based on Metal Organic Solution-Derived Amorphous Ba0.7Sr0.3TiO3 Thin Films
- Structural and Optical Properties of Electro-Optic Material: Sputtered (Ba,Sr)TiO3
- Transient Response in Monolithic Mach–Zehnder Optical Modulator Using (Ba,Sr)TiO3 Film Sputtered at Low Temperature on Silicon