Self-Limiting Atomic-Layer Selective Deposition of Silicon Nitride by Temperature-Controlled Method
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概要
- 論文の詳細を見る
- 1998-09-07
著者
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Yokoyama Shin
Research Center For Integrated Systems Hiroshima University
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Nakajima Anri
Research Center For Nanodevices And Systems Hiroshima University
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OOBA Kenji
Research Center for Nanodevices and Systems, Hiroshima University
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NAKASHIMA Yoshimitsu
Research Center for Nanodevices and Systems, Hiroshima University
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Nakashima Yoshimitsu
Research Center For Nanodevices And Systems Hiroshima University
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Ooba Kenji
Research Center For Nanodevices And Systems Hiroshima University
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