Control of Fine Particulate and Gaseous Contaminants by UV/Photoelectron Method (Special Issue on Scientific ULSI Manufacturing Technology)

スポンサーリンク

概要

• 論文の詳細を見る

• Systems for removing particulates and gaseous contaminants using the UV/photoelectron method under atmospheric and low pressure conditions have been investigated and its availability has been demonstrated. From experimental results, more than 90 % of particulate contaminants are removed by this method under atomospheric and low pressure conditions. This method can be used to design superclean spaces for wafer stockers, and wafer delivering systems in the LSI fabrication process.

• 社団法人電子情報通信学会の論文
• 1996-03-25

著者

• Fujii T

  Nikon Corporation

• Yokoyama S

  Hiroshima Univ. Higashi‐hiroshima Jpn

• Yokoyama S

  Communication Res. Lab. Kobe Jpn

• Fujii Toshiaki

  Ebara Co. Ltd.

• YOKOYAMA Shin

  Research Center for Nanodevices and Systems, Hiroshima University

• HIROSE Masataka

  Faculty of Engineering, Hiroshima University

• HIROSE Masataka

  Research Center for Integrated Systems, Hiroshima University

• Yokoyama Shin

  Research Center For Integrated Systems Hiroshima University

• Okuyama Kikuo

  Device Development Center Matsushita Electric Industrial Co. Ltd.

• Seto Takafumi

  Faculty Of Engineering Hiroshima University

• Hirose Masataka

  Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol

• OKUYAMA Kikuo

  Faculty of Engineering, Hiroshima University

• SUZUKI Hidetomo

  Ebara Research Co., Ltd.

• Hirose Masataka

  Research Center For Integrated Systems Hiroshima University

• Suzuki Hidetomo

  Ebara Research Co. Ltd.

関連論文

• Investigations of Nanoparticles by Scanning Near-Field Optical Microscopy Combined with Kelvin Probe Force Microscopy Using a Piezoelectric Cantilever
• Nanoscale Investigation of Optical and Electrical Properties by Dynamic-Mode Atomic Force Microscopy Using a Piezoelectric Cantilever
• Investigations of Local Surface Properties by SNOM Combined with KFM Using a PZT Cantilever(Special Issue on Near-Field Optics and Its Applications)
• Imprint Property of Optical Mach-Zehnder Interferometer Using Sputter Deposited (Ba,Sr)TiO_3 at Low Temperature
• Low Temperature Fabrication of Monolithic Mach-Zehnder Optical Modulator on Silicon using Sputtered (Ba,Sr)TiO_3 and Mechanism of Transient Response
• Structure and Optical Band-Gap Energies of Ba_Sr_TiO_3 Thin Films Fabricated by RF Magnetron Plasma Sputtering
• Groove-Buried Optical Waveguides Based on Metal Organic Solution-Derived Ba_Sr_TiO_3 Thin Films
• Structural and Optical Properties of Electro-Optic Material : Sputtered (Ba,Sr)TiO_3
• High-Rate GaAs Epitaxial Lift-Off Technique for Optoelectronic Integrated Circuits
• High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
• Single-Chip Integration of Light-Emitting Diode, Waveguide and Micrormirrors
• Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
• Evaluation of Plasma-Induced Damage by Medium-Energy Ion Scattering
• Chemical Bonding Features of Fluorine and Boron in BF^+_2 -Ion-Implanted Si
• Comparative Studies of Perfluorocarbon Alternative Gas Plasmas for Contact Hole Etch
• Quantitative Evaluation of Dopant Loss in 5-10 keV As Ion Implantation for Low-Resistive, Ultrashallow Source/Drain Formation
• An Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
• Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
• Optically Interconnected Kohonen Net for Pattern Recognition
• High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
• New RAM-bus Memory System with Interchip Optical Interconnection
• Micron-Size Optical Waveguide for Optoelectronic Integrated Circuit
• Medium-Energy Ion Spectroscopy Using Ion Implanter
• A Study of Electrical Characteristics Improvements in Sub-0.1 μm Gate Length MOSFETs by Low Temperature Operation
• New Ar-Plasma Cleaning Process for Reduction of Al/TiSi_2 Contact Resistance
• Bipolar Voltage Pulse Induced Current : A Means for Reliable Extraction of Interface Trap Distribution in Ultrathin Oxides MOS Structures
• Determination of Valence Band Alignment at Ultrathin SiO_2/Si Interfaces by High-Resolution X-Ray Photoelectron Spectroscopy
• Valence Band Alignment at Ultra-Thin SiO_2/Si(111) Interfaces as Determined by High-Resolution X-Ray Photoelectron Spectroscopy
• Valence Band Alignment at Ultra-Thin SiO_2/Si(111) Interfaces as Determined by High-Resolution X-Ray Photoelectron Spectroscopy
• Analysis and Design of Low Loss and Low Mode-Shift Integrated Optical Waveguides Using Finite-Difference Time-Domain Method
• Organic Contamination Dependence of Process-Induced Interface Trap Generation in Ultrathin Oxide Metal Oxide Semiconductor Transistors
• Fabrication Technologies for Double-SiO_2-Barrier Metal-Oxide-Semiconductor Transistor with a Poly-Si Dot
• Calculation of Electrical Properties of Novel Double-Barrier Metal Oxide Semiconductor Transistors
• Effects of Hydrogen and Bias on Single-Crystal Al Growth on Vicinal Si by DC Magnetron Sputtering
• Influence of Organic Contaminant on Trap Generation in Thin SiO_2 of Metal-Oxide-Semiconductor Capacitors
• Influence of Organic Contaminant on Breakdown Characteristics of MOS Capacitors with Thin SiO_2
• Effect of Light Irradiation on Native Oxidation of Silicon Surface
• Influence of Organic Contaminant on Breakdown Characteristics of MOS Capacitors with Thin SiO_2
• Temperature Dependence of Gain Characteristics in 1.3-μm AlGaInAs/InP Strained Multiple-Quantum-Well Semiconductor Lasers (Joint Special Issue on Recent Progress in Optoelectronics and Communications)
• Temperature Dependence of Gain Characteristics in 1.3-μm AlGaInAs/InP Strained Multiple-Quantum-Well Semiconductor Lasers (Joint Special Issue on Recent Progress in Optoelectronics and Communications)
• Adaptive Clipping Level Control for OFDM Peak Power Reduction Using Clipping and Filtering(Special Section on Multi-dimensional Mobile Information Networks)
• Analysis of Electromagnetic Wave Scattering by a Conducting Thin Plate and Image Coefficient for Ray Tracing Method
• Analysis of Plane Wave Scattering by a Conducting Thin Plate and a Criterion for Ray Tracing Method
• Wiener-Hopf Solutions to Electromagnetic Wave Scattering by a Finite Conducting Thin Plate in Case of a Line Source
• Design of Optically Coupled Three-Dimensional Content Addressable Memory
• Control of Fine Particulate and Gaseous Contaminants by UV/Photoelectron Method (Special Issue on Scientific ULSI Manufacturing Technology)
• Coupled Monte Carlo-Energy Relaxation Analysis of Hot Carrier Light Emission in Metal Oxide Semiconductor Field Effect Transistor's
• Carrier Mobility in Metal-Oxide-Semiconductor Field Effect Transistor with Atomic-Layer-Deposited Si-Nitride Gate Dielectrics
• Conduction Mechanism in Extremely Thin Poly-Si Wires : Width Dependence of Coulomb Blockade Effect
• Low-Temperature Selective Deposition of Silicon by Time-Modulation Exposure of Disilane and Formation of Silicon Nanowires
• Investigation of Surface Contamination on Silicon Oxide after Hydrofluoric Acid Etching by Noncontact Capacitance Method
• Evaluation of Surface Contamination by Noncontact Capacitance Method under UV Irradiation
• Two-Dimensional Device Simulator VENUS-2D/B for Amorphous Silicon Thin-Film Transistors Using a Gap-State Model
• Influence of Wafer Material on Defect Generation During Deep Submicron LOCOS Process
• Fabrication of spin-coat optical waveguides for optically interconnected LSI and influence of fabrication process on lower layer MOS capacitors
• Optical Modulator Using Metal-Oxide-Semiconductor Type Si Ring Resonator
• Magneto-optic Effect in Amorphous Bi_3Fe_5O_ Waveguide Sputtered at Room Temperature
• Photoelastic Effect in Silicon Ring Resonator
• Layer-by-Layer Growth of Bi-Sr-Ca-Cu-O Superconducting Films by Molecular Beam Epitaxy
• A Semi-Analytical Approach to Compute the Decay of Optically Generated Carriers in Silicon Wafer
• Evaluation of Front-Opening Unified Pod with Attached UV/Photocatalyst Cleaning Unit
• Design and Simulation of Silicon Ring Optical Modulator with p/n Junctions along Circumference
• Sensitivity Improvement of Biosensors Using Si Ring Optical Resonators
• Detection of Antigen--Antibody Reaction Using Si Ring Optical Resonators Functionalized with an Immobilized Antibody-Binding Protein
• A Study of Mach--Zehnder Interferometer Type Optical Modulator Applicable to an Accelerometer
• Fabrication of Si Nanowire Field-Effect Transistor for Highly Sensitive, Label-Free Biosensing
• Si Ring Optical Resonators for Integrated On-Chip Biosensing
• Two-Dimensional Device Simulation for Polycrystalline Silicon Thin-Film Transistor
• Fabrication of High-Density Diamond Nanotips by Electron Beam Lithography
• Implanted Antimony Precipitation in Silicon Studied by Medium-Energy Ion Scattering
• Investigation of Surface Contamination on Silicon Oxide after Hydrofluoric Acid Etching by Noncontact Capacitance Method
• Comparative Studies of Perfluorocarbon Alternative Gas Plasmas for Contact Hole Etch
• Self-Limiting Atomic-Layer Selective Deposition of Silicon Nitride by Temperature-Controlled Method
• Compact Branched Optical Waveguides Using High-Index-Contrast Stacked Structure
• Stacked Optical Branched Waveguides for Optical Interconnection on Si Chips
• Single-Crystal Growth of Al(110) on Vicinal Si(100) in Ultra-High-Vacuum Sputtering System
• 2B-1-4 The Effects of Negative Ions on Central and Autonomic Nervous Activities (Proceedings of the 39th Meeting of Japan Society of Physiological Anthropology)
• Influence of Sputtering Geometry on Crystallinity of Al(110) Thin Films on Offset (100)Si
• Race-Track Optical Ring Resonators with Groove Coupling
• Design and Simulation of Ring Resonator Switches using Electro-Optic Materials
• Compact Multi-Mode Optical Ring Resonators for Interconnection on Si Chips
• Characterization of Ge Photodiodes Fabricated on Vicinal Si Substrate
• Optimum Atomic Spacing for AlAs Etching in GaAs Epitaxial Lift-Off Technology
• Contact-Hole Etching with NH3-Added C5F8 Pulse-Modulated Plasma
• SiO2 Hole Etching Using Perfluorocarbon Alternative Gas with Small Global Greenhouse Effect
• Silicon Ring Optical Modulator with p/n Junctions Arranged along Waveguide for Low-Voltage Operation (Special Issue : Solid State Devices and Materials (2))
• Design and Simulation of Ring Resonator Optical Switches using Electro-Optic Materials
• Anomalous Behavior of Interface Traps of Si MOS Capacitors Contaminated with Organic Molecules
• Magneto-Optic Effect in Amorphous Bi3Fe5O12 Waveguides Sputtered at Room Temperature
• Optically Interconnected Kohonen Net for Pattern Recognition
• Phosphorus-Assisted Low-Energy Arsenic Implantation Technology for N-Channel Metal–Oxide–Semiconductor Field-Effect Transistor Source/Drain Formation Process
• Organic Contamination Dependence of Process-Induced Interface Trap Generation in Ultrathin Oxide Metal Oxide Semiconductor Transistors
• Photoelastic Effect in Silicon Ring Resonators
• Evaluation of Front-Opening Unified Pod with Attached UV/Photocatalyst Cleaning Unit
• Effect of Light Irradiation on Native Oxidation of Silicon Surface
• Imprint Property of Optical Mach–Zehnder Interferometers Using (Ba,Sr)TiO3 Sputter-Deposited at 450 °C
• High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
• Fabrication of Spin-Coated Optical Waveguides for Optically Interconnected LSI and Influence of Fabrication Process on Underlying Metal–Oxide–Semiconductor Capacitors
• Compact Multimode Optical Ring Resonators for Interconnection on Silicon Chips
• Groove-Buried Optical Waveguides Based on Metal Organic Solution-Derived Amorphous Ba0.7Sr0.3TiO3 Thin Films

もっと見る 閉じる

スポンサーリンク