Comparative Studies of Perfluorocarbon Alternative Gas Plasmas for Contact Hole Etch
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-09-15
著者
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Hirose Masataka
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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YOKOYAMA Shin
Research Center for Nanodevices and Systems, Hiroshima University
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SHIBAHARA Kentaro
Research Center for Nanodevices and Systems, Hiroshima University
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NAKAMURA Shingo
Chemical Division, DAIKIN Industries, Ltd.
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ITANO Mitsushi
Chemical Division, DAIKIN Industries, Ltd.
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AOYAMA Hirokazu
Chemical Division, DAIKIN Industries, Ltd.
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Yokoyama S
Research Center For Nanodevices And Systems Hiroshima University
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Shibahara K
Research Center For Nanodevices And Systems Hiroshima University
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Hirose Masataka
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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