An Impurity-Enhanced Oxidation Assisted Doping Profile Evaluation for Three-Dimensional and Vertical-Channel Transistors
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概要
- 論文の詳細を見る
- 2004-09-15
著者
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SHIBAHARA Kentaro
Research Center for Nanodevices and Systems, Hiroshima University
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Okuyama Kiyoshi
Research Center For Nanodevices And Systems Hiroshima University
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Kobayashi Kei
Research Center For Nanodevices And Systems Hiroshima University
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SUNAMI Hideo
Research Center for Nanodevices and Systems, Hiroshima University
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ETO Takanori
Research Center for Nanodevices and Systems, Hiroshima University
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Eto Takanori
Research Center For Nanodevices And Systems Hiroshima University
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Okuyama Kiyoshi
Research Center For Nanodevice And Systems Hiroshima University
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Shibahara Kentaro
Research Center For Nanodevices And Systems Hiroshima University
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Sunami Hideo
Research Center For Nanodevice And Systems Hiroshima University
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Shibahara Kentaro
Reseach Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
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