An Optimized Silicidation Technique for Source and Drain of FINFET
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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Okuyama Kiyoshi
Research Center For Nanodevices And Systems Hiroshima University
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SUNAMI Hideo
Research Center for Nanodevices and Systems, Hiroshima University
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SUGIMURA Atsushi
Research Center for Nanodevice and Systems, Hiroshima University
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Okuyama Kiyoshi
Research Center For Nanodevice And Systems Hiroshima University
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Sunami Hideo
Research Center For Nanodevice And Systems Hiroshima University
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Sugimura Atsushi
Research Center For Nanodevice And Systems Hiroshima University
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