New Ar-Plasma Cleaning Process for Reduction of Al/TiSi_2 Contact Resistance
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-11-15
著者
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Yokoyama S
Hiroshima Univ. Higashi‐hiroshima Jpn
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Yokoyama S
Communication Res. Lab. Kobe Jpn
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YOKOYAMA Shin
Research Center for Nanodevices and Systems, Hiroshima University
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SHIBAHARA Kentaro
Research Center for Nanodevices and Systems, Hiroshima University
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TSUNO Morikazu
Research Center for Integrated Systems, Hiroshima University
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Yokoyama Shin
Research Center For Integrated Systems Hiroshima University
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Shibahara K
Research Center For Nanodevices And Systems Hiroshima University
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Tsuno M
The Research Center For Nanodevices And Systems Hiroshima University
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Tsuno Morikazu
Research Center For Integrated Systems Hiroshima University
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Shibahara K
Hiroshima Univ. Higashihiroshima‐shi Jpn
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Shibahara Kentaro
Research Center For Nanodevices And Systems Hiroshima University
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Shibahara Kentaro
Reseach Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
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