Influence of Organic Contaminant on Breakdown Characteristics of MOS Capacitors with Thin SiO_2
スポンサーリンク
概要
- 論文の詳細を見る
- 2000-08-28
著者
-
SUZUKI Tsuneo
Extreme Energy-Density Research Institute, Nagaoka University of Technology
-
Fujii Toshiaki
Ebara Co. Ltd.
-
YOKOYAMA Shin
Research Center for Nanodevices and Systems, Hiroshima University
-
Yoshino Takenobu
Research Center For Nanodevices And Systems Hiroshima University
-
SUZUKI Tsukuru
Ebara Research Co., Ltd.
-
Suzuki Tsuneo
Extreme Energy-density Res. Inst. Nagaoka Univ. Of Technol.
-
Yokoyama Shin
Research Center For Integrated Systems Hiroshima University
-
Yokoyama S
Research Center For Nanodevices And Systems Hiroshima University
-
Yokoyama S
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
-
Suzuki Tsukuru
Ebara Research Co. Ltd.
-
Suzuki Tsukuru
Ebara Corporation, Fujisawa, Kanagawa 251-8502, Japan
関連論文
- Formation of thick cubic boron nitride films in noble gases
- Effect of Ambient Gas Temperature on Synthesis of Fe-N Nanosized Powders by Pulsed Wire Discharge
- Formation and structural characteristic of perpendicularly aligned boron nitride nanosheet bridges in polymer/boron nitride composite film and its thermal conductivity (Special issue: Nano electronic materials)
- Fabrication of the finestructured alumina materials with nanoimprint method
- Effect of Wire Diameter on Particle Size of Metal Nanosized Powder Prepared by Pulsed Wire Discharge
- Synthesis of Fe-N Nanosized Powders by Pulsed Wire Discharge
- Synthesis of Single-Walled Carbon Nanotubes by Pulsed Wire Discharge
- Extinction of Large Droplets in Ion-Beam Ablation Plasma Produced by Ion-Beam Evaporation
- Preparation of SrAl_2O_4:Eu, Dy Phosphor Thin Films on Organic Substrates by Pulsed Ion-Beam Evaporation
- Preparation of Ti-Fe Hydrogen Storage Alloy Thin Films by Pulsed Laser Deposition
- Oxidation Resistance of Cr-N-O Thin Films Prepared by Pulsed Laser Deposition
- Reduction of Oxygen Content in Ti-Fe Thin Films Prepared by Pulsed Laser Deposition
- Deposition Process of Aluminum Thin Films by Intense Pulsed Light Ion-Beam Evaporation
- Imprint Property of Optical Mach-Zehnder Interferometer Using Sputter Deposited (Ba,Sr)TiO_3 at Low Temperature
- Low Temperature Fabrication of Monolithic Mach-Zehnder Optical Modulator on Silicon using Sputtered (Ba,Sr)TiO_3 and Mechanism of Transient Response
- Preparation of Ti-Ni-N-O Thin Films by Pulsed Laser Deposition
- Structure and Optical Band-Gap Energies of Ba_Sr_TiO_3 Thin Films Fabricated by RF Magnetron Plasma Sputtering
- Groove-Buried Optical Waveguides Based on Metal Organic Solution-Derived Ba_Sr_TiO_3 Thin Films
- Structural and Optical Properties of Electro-Optic Material : Sputtered (Ba,Sr)TiO_3
- Fine-structured ZnO patterns with sub-micrometer on the ceramic surface fabricated by a replication method
- High-Rate GaAs Epitaxial Lift-Off Technique for Optoelectronic Integrated Circuits
- High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
- Single-Chip Integration of Light-Emitting Diode, Waveguide and Micrormirrors
- Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
- Evaluation of Plasma-Induced Damage by Medium-Energy Ion Scattering
- Chemical Bonding Features of Fluorine and Boron in BF^+_2 -Ion-Implanted Si
- Synthesis of aluminum nitride nanopowder with particle size less than 10nm by pulsed wire discharge in nitrogen gas
- Synthesis Of TiO2 nanosized powder by pulsed wire discharge (Special issue: Nano electronic materials)
- Abrupt slope change in temperature dependence of resistivity in Ni-Fe-O sintered body (特集 環境保護に必須のナノテク材料)
- Synthesis of Al2O3 nanosized powder by pulsed wire discharge using gas puff (特集 環境保護に必須のナノテク材料)
- Preparation of Ti-Fe hydrogen storage alloy thin films by pulsed laser deposition
- Oxidation Resistance of Cr-N-O Thin Films Prepared by Pulsed Laser Deposition
- Surface Modification of Graphite Targets by Intense Pulsed Ion Beam Irradiation
- Preparation of Polycrystalline Silicon Thin Films by Pulsed Ion-Beam Evaporation
- Preparation of Polycrystalline Silicon Thin Films by Pulsed Ion-Beam Evaporation
- Comparative Studies of Perfluorocarbon Alternative Gas Plasmas for Contact Hole Etch
- Quantitative Evaluation of Dopant Loss in 5-10 keV As Ion Implantation for Low-Resistive, Ultrashallow Source/Drain Formation
- An Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
- Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
- Optically Interconnected Kohonen Net for Pattern Recognition
- High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
- New RAM-bus Memory System with Interchip Optical Interconnection
- Micron-Size Optical Waveguide for Optoelectronic Integrated Circuit
- Medium-Energy Ion Spectroscopy Using Ion Implanter
- Nanosize Al_2O_3 Powder Production by Pulsed Wire Discharge
- Synthesis of Nanosize Powders of Aluminum Nitride by Pulsed Wire Discharge
- Preparation and Characterization of C-N-H-O Thin Film by Ion Beam Evaporation
- Synthesis of Ti-Al Intermetallic Compound Films by Intense Pulsed Ion Beam Evaporation
- Preparation of B_4C Thin Film by Intense Pulsed Ion-Beam Evaporation
- Pulsed Ion-Beam Evaporation for Thin-Film Deposition
- Pulsed Power Technology and Its Applications at Extreme Energy-Density Research Institute (EDI), Nagaoka
- Comparison of the Planarization Technologies for the Next Generation
- New Ar-Plasma Cleaning Process for Reduction of Al/TiSi_2 Contact Resistance
- Bipolar Voltage Pulse Induced Current : A Means for Reliable Extraction of Interface Trap Distribution in Ultrathin Oxides MOS Structures
- Determination of Valence Band Alignment at Ultrathin SiO_2/Si Interfaces by High-Resolution X-Ray Photoelectron Spectroscopy
- Valence Band Alignment at Ultra-Thin SiO_2/Si(111) Interfaces as Determined by High-Resolution X-Ray Photoelectron Spectroscopy
- Valence Band Alignment at Ultra-Thin SiO_2/Si(111) Interfaces as Determined by High-Resolution X-Ray Photoelectron Spectroscopy
- Organic Contamination Dependence of Process-Induced Interface Trap Generation in Ultrathin Oxide Metal Oxide Semiconductor Transistors
- Fabrication Technologies for Double-SiO_2-Barrier Metal-Oxide-Semiconductor Transistor with a Poly-Si Dot
- Calculation of Electrical Properties of Novel Double-Barrier Metal Oxide Semiconductor Transistors
- Effects of Hydrogen and Bias on Single-Crystal Al Growth on Vicinal Si by DC Magnetron Sputtering
- Influence of Organic Contaminant on Trap Generation in Thin SiO_2 of Metal-Oxide-Semiconductor Capacitors
- Influence of Organic Contaminant on Breakdown Characteristics of MOS Capacitors with Thin SiO_2
- Effect of Light Irradiation on Native Oxidation of Silicon Surface
- Influence of Organic Contaminant on Breakdown Characteristics of MOS Capacitors with Thin SiO_2
- Preparation and Characterization of Cr-N-O Thin Films by Pulsed Laser Deposition
- Characteristics of (Cr_, Al_x)N Films Prepared by Pulsed Laser Deposition
- Characteristics of CrN Films Prepared by Pulsed Laser Deposition
- Design of Optically Coupled Three-Dimensional Content Addressable Memory
- Control of Fine Particulate and Gaseous Contaminants by UV/Photoelectron Method (Special Issue on Scientific ULSI Manufacturing Technology)
- Coupled Monte Carlo-Energy Relaxation Analysis of Hot Carrier Light Emission in Metal Oxide Semiconductor Field Effect Transistor's
- Carrier Mobility in Metal-Oxide-Semiconductor Field Effect Transistor with Atomic-Layer-Deposited Si-Nitride Gate Dielectrics
- Conduction Mechanism in Extremely Thin Poly-Si Wires : Width Dependence of Coulomb Blockade Effect
- Low-Temperature Selective Deposition of Silicon by Time-Modulation Exposure of Disilane and Formation of Silicon Nanowires
- Investigation of Surface Contamination on Silicon Oxide after Hydrofluoric Acid Etching by Noncontact Capacitance Method
- Evaluation of Surface Contamination by Noncontact Capacitance Method under UV Irradiation
- Influence of Wafer Material on Defect Generation During Deep Submicron LOCOS Process
- Fabrication of spin-coat optical waveguides for optically interconnected LSI and influence of fabrication process on lower layer MOS capacitors
- Optical Modulator Using Metal-Oxide-Semiconductor Type Si Ring Resonator
- Magneto-optic Effect in Amorphous Bi_3Fe_5O_ Waveguide Sputtered at Room Temperature
- Photoelastic Effect in Silicon Ring Resonator
- Layer-by-Layer Growth of Bi-Sr-Ca-Cu-O Superconducting Films by Molecular Beam Epitaxy
- Evaluation of Front-Opening Unified Pod with Attached UV/Photocatalyst Cleaning Unit
- Preparation and Characterization of Cr--Zn--N--O Thin Films Deposited by Pulsed Laser Deposition
- Fourier-Transform Infrared Absorption Spectroscopy of Chromium Nitride Thin Film
- Phase Control of Ti--Fe Nanoparticles Prepared by Pulsed Wire Discharge
- Preparation and Process Clarification of Metal Nanoplate by Pulse Wire Discharged Method in Liquid Media
- High-Pressure Synthesis of CuBa2Ca3Cu4O10+\delta Superconductor from Precursors Prepared by a Polymerized Complex Method
- Fabrication of β-SiC micropatterns from a facile replication process
- Formation and Structural Characteristic of Perpendicularly Aligned Boron Nitride Nanosheet Bridges in Polymer/Boron Nitride Composite Film and Its Thermal Conductivity
- Anisotropic alignment of non-modified BN nanosheets in polysiloxane matrix under nano pulse width electricity
- Implanted Antimony Precipitation in Silicon Studied by Medium-Energy Ion Scattering
- Effects of Annealing on Material Characteristics of Diamond-Like Carbon Film Formed by Focused-Ion-Beam Chemical Vapor Deposition
- Compact Branched Optical Waveguides Using High-Index-Contrast Stacked Structure
- Stacked Optical Branched Waveguides for Optical Interconnection on Si Chips
- Synthesis of Aluminum Nitride Nanopowder with Particle Size Less than 10 nm by Pulsed Wire Discharge in Nitrogen Gas
- 2B-1-4 The Effects of Negative Ions on Central and Autonomic Nervous Activities (Proceedings of the 39th Meeting of Japan Society of Physiological Anthropology)
- Organic Contamination Dependence of Process-Induced Interface Trap Generation in Ultrathin Oxide Metal Oxide Semiconductor Transistors
- Evaluation of Front-Opening Unified Pod with Attached UV/Photocatalyst Cleaning Unit
- Effect of Light Irradiation on Native Oxidation of Silicon Surface