Fourier-Transform Infrared Absorption Spectroscopy of Chromium Nitride Thin Film
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概要
- 論文の詳細を見る
Chromium nitride thin films were deposited by RF reactive unbalanced magnetron sputtering on (100) Si single-crystal or glassy carbon substrates. The characteristics of the thin films were measured by Rutherford backscattering spectroscopy, X-ray diffractometry, and scanning electron microscopy. From the results of the above measurements, it was found that our samples were stoichiometric chromium nitride thin films. The chemical bonding state was estimated using the results of the Fourier-transform infrared spectroscopy. A peak attributed to the Cr--N bond was observed at around 380 cm-1, and it could be obtained with any beam splitter and atmosphere. Furthermore, the influence of residual stress was also investigated. Residual stresses of CrN thin films, which were calculated from their strains, were quite low.
- 2011-01-25
著者
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Ohori Tetsutaro
Extreme Energy-Density Research Institute, Nagaoka University of Technology
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Shirahata Jun
Extreme Energy-Density Research Institute, Nagaoka University of Technology
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Niihara Koichi
Extreme Energy-density Res. Inst. Nagaoka Univ. Of Technol.
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Suzuki Tsuneo
Extreme Energy-density Res. Inst. Nagaoka Univ. Of Technol.
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Asami Hiroki
Department Of Bioengineering Nagaoka University Of Technology
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Nakayama Tadachika
Extreme Energy-density Research Institute Nagaoka University Of Technology
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Suematsu Hisayuki
Extreme Energy-density Res. Inst. Nagaoka Univ. Of Technol.
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Asami Hiroki
Department of Mechanical Engineering, Tomakomai National College of Technology, Tomakomai, Hokkaido 059-1275, Japan
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Ohori Tetsutaro
Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan
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Nakayama Tadachika
Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan
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