Characteristics of CrN Films Prepared by Pulsed Laser Deposition
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概要
- 論文の詳細を見る
Chromium nitride (CrN) films have been successfully prepared by pulsed laser deposition (PLD). An experiment was carried out by changing the substrate temperature from RT to 600°C. The hardness of the films increased gradually with an increase in the substrate temperature up to 400°C, above which it decreased rapidly. Furthermore, the maximum Vickers hardness (HV) value was ${\sim}2000$. The rapid decrease in the hardness was induced by the formation of ellipsoidal grains. The boundaries of these grains appear to have structural defects. As a result of an oxidation test, it was confirmed by Fourier transform infrared spectroscopy (FTIR) that the CrN film is oxidized at a temperature close to 600°C. At this temperature, some cracks appear which is considered to be due to the volume expansion induced by oxidation.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-02-28
著者
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Hirai Makoto
Extreme Energy-density Research Institute Nagaoka University Of Technology
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Jiang Weihua
Extreme Energy-density Research Institute Nagaoka University Of Technology
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Suzuki Tsuneo
Extreme Energy-density Res. Inst. Nagaoka Univ. Of Technol.
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Yatsui Kiyoshi
Extreme Energy Density Research Institute Nagaoka University Of Technology
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Grigoriu Constantin
Extreme Energy-density Research Institute Nagaoka University Of Technology
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Ueno Yasuhiro
Extreme Energy-density Research Institute Nagaoka University Of Technology
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Ueno Yasuhiro
Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan
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Grigoriu Constantin
Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan
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Jiang Weihua
Extreme Energy Density Research Institute, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan
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