Low-Temperature Selective Deposition of Silicon by Time-Modulation Exposure of Disilane and Formation of Silicon Nanowires

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概要

• 論文の詳細を見る
• 2000-08-28

著者

• YOKOYAMA Shin

  Research Center for Nanodevices and Systems, Hiroshima University

• NAKAJIMA Anri

  Research Center for Nanodevices and Systems, Hiroshima University

• Yokoyama Shin

  Research Center For Integrated Systems Hiroshima University

• Yokoyama S

  Research Center For Nanodevices And Systems Hiroshima University

• Nakajima A

  Research Center For Nanodevices And Systems Hiroshima University

• Nakajima Anri

  Research Center For Nanodevices And Systems Hiroshima University

• Nomura Akihiro

  Research Center For Nanodevices And Systems Hiroshima University

• KAWAMURA Kensaku

  Research Center for Nanodevices and Systems, Hiroshima University

• KIDERA Toshirou

  Research Center for Nanodevices and Systems, Hiroshima University

• OHBA Kenji

  Research Center for Nanodevices and Systems, Hiroshima University

• KIDERA Toshiro

  Research Center for Nanodevices and Systems, Hiroshima University

• Ohba Kenji

  Research Center For Nanodevices And Systems Hiroshima University

• Kidera Toshirou

  Research Center For Nanodevices And Systems Hiroshima University

• Ohkura Kensaku

  Research Center For Nanodevices And Systems Hiroshima University

• Kawamura Kensaku

  Research Center For Nanodevices And Systems Hiroshima University

関連論文

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