Investigation of Surface Contamination on Silicon Oxide after Hydrofluoric Acid Etching by Noncontact Capacitance Method
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概要
- 論文の詳細を見る
- 2003-12-15
著者
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YOKOYAMA Shin
Research Center for Nanodevices and Systems, Hiroshima University
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Hirae Sadao
Dainippon Screen Manufacturing Co. Ltd.
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Kohno Motohiro
Dainippon Screen Manufacturing Co. Ltd.
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Kitajima Takeshi
Dainippon Screen Manufacturing Co. Ltd.
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KITAJIMA Toshikazu
Dainippon Screen Manufacturing Co., Ltd.
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